Klipsch School of Electrical and Computer Engineering, New Mexico State University, Las Cruces, New Mexico 88003, USA.
Opt Lett. 2013 Jul 15;38(14):2569-71. doi: 10.1364/OL.38.002569.
We demonstrate enhanced sensitivity of a nanostructured plasmonic sensor that utilizes resonance in intentional structural defects within a plasmonic crystal. The measured sensitivity of the fabricated nanosensor is ~500 nm/RIU showing improvement over traditional nanohole array sensors. Furthermore, the defects provide an additional design parameter to increase sensitivity by engineering plasmon lifetime.
我们展示了一种纳米结构等离子体传感器的灵敏度增强，该传感器利用等离子体晶体中有意结构缺陷中的共振。所制造的纳米传感器的测量灵敏度约为 500nm/RIU，优于传统的纳米孔阵列传感器。此外，这些缺陷通过工程化等离子体寿命提供了一个额外的设计参数来提高灵敏度。
