Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States.
ACS Nano. 2013 Sep 24;7(9):7956-66. doi: 10.1021/nn403056k. Epub 2013 Aug 21.
All large-scale graphene films contain extended topological defects dividing graphene into domains or grains. Here, we spatially map electronic transport near specific domain and grain boundaries in both epitaxial graphene grown on SiC and CVD graphene on Cu subsequently transferred to a SiO2 substrate, with one-to-one correspondence to boundary structures. Boundaries coinciding with the substrate step on SiC exhibit a significant potential barrier for electron transport of epitaxial graphene due to the reduced charge transfer from the substrate near the step edge. Moreover, monolayer-bilayer boundaries exhibit a high resistance that can change depending on the height of substrate step coinciding at the boundary. In CVD graphene, the resistance of a grain boundary changes with the width of the disordered transition region between adjacent grains. A quantitative modeling of boundary resistance reveals the increased electron Fermi wave vector within the boundary region, possibly due to boundary induced charge density variation. Understanding how resistance change with domain (grain) boundary structure in graphene is a crucial first step for controlled engineering of defects in large-scale graphene films.
所有大规模的石墨烯薄膜都包含扩展的拓扑缺陷,这些缺陷将石墨烯分成畴或晶粒。在这里,我们通过空间映射来确定 SiC 上外延生长的石墨烯和随后转移到 SiO2 衬底上的 CVD 石墨烯中特定畴和晶界附近的电子输运情况,与边界结构一一对应。与 SiC 上衬底台阶重合的边界由于靠近台阶边缘的衬底电荷转移减少,对外延石墨烯的电子输运表现出显著的势垒。此外,单层-双层边界表现出较高的电阻,其电阻值取决于与边界重合的衬底台阶的高度。在 CVD 石墨烯中,晶界的电阻随相邻晶粒之间无序过渡区域的宽度而变化。边界电阻的定量模型揭示了边界区域内电子费米波矢的增加,这可能是由于边界诱导的电荷密度变化。了解电阻如何随石墨烯中的畴(晶)界结构变化,是对大规模石墨烯薄膜中缺陷进行可控工程的关键的第一步。