IS2M-CNRS UMR 7361, UHA , 15 rue Jean Starcky, 68057, Mulhouse, France.
Langmuir. 2013 Oct 15;29(41):12796-803. doi: 10.1021/la402935v. Epub 2013 Oct 3.
In situ high-temperature AFM was used to locally follow dynamic processes, leading to directed self-assembly of copolymers in the context of graphoepitaxy. We focused on the effect of heating for temperatures much higher than the Tg of the used PS-b-PMMA polymer. We showed that such conditions favors the block rearrangement, leading to very regular and perfectly aligned structures in limited times. The use of in situ AFM allowed us to locally investigate the self-organization process at high temperature, thus bringing new insights into self-assembly of block copolymers by graphoepitaxy. In particular, we demonstrate that a slight increase of temperature between 180 and 200 °C allowed overpassing an energy barrier and considerably improves the long distance arrangement, even for relatively short times.
原位高温原子力显微镜用于局部跟踪动态过程，在图形外延的背景下引导共聚物的定向自组装。我们专注于加热温度远高于所使用的 PS-b-PMMA 聚合物的 Tg 的情况。我们表明，这种条件有利于嵌段重排，从而在有限的时间内形成非常规则和完全对齐的结构。原位原子力显微镜的使用使我们能够在高温下局部研究自组织过程，从而为图形外延诱导的嵌段共聚物自组装提供了新的见解。特别是，我们证明在 180 到 200°C 之间稍微升高温度可以克服能垒，并大大改善长程排列，即使时间相对较短也是如此。
