Goray Leonid, Lubov Maxim
Academic University , St Petersburg, 194021, Russian Federation ; Institute for Analytical Instrumentation RAS , St Petersburg, 194021, Russian Federation.
J Appl Crystallogr. 2013 Aug 1;46(Pt 4):926-932. doi: 10.1107/S0021889813012387. Epub 2013 Jun 7.
It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin-film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion-beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short-wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques.
结果表明，在薄膜生长的非线性连续介质方程中适当考虑某些项，可使其适用于模拟具有大边界轮廓高度和/或梯度跃变的多层光栅表面。所提出的模型描述了通过磁控溅射和离子束沉积在具有闪耀槽轮廓的硅衬底上生长的光栅的Mo/Si和Al/Zr边界的平滑和位移。已对多层Mo/Si和Al/Zr光栅的生长进行了计算机模拟。在应用于计算边界轮廓的边界积分方程框架内，已求出Mo/Si和Al/Zr光栅在极紫外范围内的绝对衍射效率。已经证明，这里开发的用于计算多层光栅边界轮廓和短波散射强度的综合方法，至少对于已知材料和生长技术而言，为开展精度与同步辐射测量相当的研究开辟了一条途径。
