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经冷等离子体处理实现聚二甲基硅氧烷表面长期减水疏油性。

Long-term reduction in poly(dimethylsiloxane) surface hydrophobicity via cold-plasma treatments.

机构信息

Department of Materials Science and Engineering, University of Wisconsin-Madison , 1509 University Avenue, Madison, Wisconsin 53706, United States.

出版信息

Langmuir. 2013 Oct 22;29(42):12990-6. doi: 10.1021/la403077q. Epub 2013 Oct 9.

Abstract

Poly(dimethylsiloxane), PDMS, a versatile elastomer, is the polymer of choice for microfluidic systems. It is inexpensive, relatively easy to pattern, and permeable to oxygen. Unmodified PDMS is highly hydrophobic. It is typically exposed to an oxygen plasma to reduce this hydrophobicity. Unfortunately, the PDMS surface soon returns to its original hydrophobic state. We present two alternative plasma treatments that yield long-term modification of the wetting properties of a PDMS surface. An oxygen plasma pretreatment followed by exposure to a SiCl4 plasma and an oxygen-CCl4 mixture plasma both cause a permanent reduction in the hydrophobicity of the PDMS surface. We investigate the properties of the plasma-treated surfaces with X-ray photoelectron spectroscopy (XPS) and contact angle measurements. We propose that the plasma treated PDMS surface is a dynamic mosaic of high- and low-contact-angle functionalities. The SiCl4 and CCl4 plasmas attach polar groups that block coverage of the surface by low-molecular-weight groups that exist in PDMS. We describe an application that benefits from these new plasma treatments, the use of a PDMS stencil to form dense arrays of DNA on a surface.

摘要

聚二甲基硅氧烷(PDMS)是一种通用弹性体,是微流控系统的首选聚合物。它价格低廉,易于图案化,并且对氧气具有渗透性。未经修饰的 PDMS 具有很强的疏水性。通常会将其暴露于氧气等离子体中以降低疏水性。不幸的是,PDMS 表面很快会恢复到原始的疏水性状态。我们提出了两种替代的等离子体处理方法,可长期改变 PDMS 表面的润湿性。氧气等离子体预处理后再暴露于 SiCl4 等离子体和氧气-四氯化碳混合物等离子体都会导致 PDMS 表面的疏水性永久降低。我们使用 X 射线光电子能谱(XPS)和接触角测量来研究等离子体处理表面的性质。我们提出,经等离子体处理的 PDMS 表面是具有高和低接触角功能的动态镶嵌图案。SiCl4 和 CCl4 等离子体可附着极性基团,阻止存在于 PDMS 中的低分子量基团覆盖表面。我们描述了一种得益于这些新的等离子体处理的应用,即使用 PDMS 模板在表面上形成密集的 DNA 阵列。

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