Department of Materials Science and Engineering, Massachusetts Institute of Technology , 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States.
Nano Lett. 2013 Nov 13;13(11):5117-22. doi: 10.1021/nl4021683. Epub 2013 Oct 7.
A two-stage annealing process for block copolymer films was introduced consisting of a solvent vapor exposure followed by a thermal cycle. By heating the film but not the chamber, changes in the ambient vapor pressure of the solvent were avoided. Films of block copolymers and homopolymers showed transient nonmonotonic swelling behavior immediately after solvent exposure that was dependent on how the thin film was cast before the anneal. Thermal cycling of the solvent-swelled block copolymer films during the solvent vapor anneal (SVA) caused the films to deswell in 1-10 s and produced well-ordered microdomains in templated 45.5 and 51.5 kg/mol polystyrene-block-polydimethylsiloxane films annealed in toluene and n-heptane vapors for total process times of 30 s to 5 min.
引入了一种用于嵌段共聚物薄膜的两阶段退火工艺，包括溶剂蒸气暴露和热循环。通过加热薄膜而不是腔室，可以避免溶剂环境蒸气压力的变化。嵌段共聚物和均聚物的薄膜在溶剂暴露后立即表现出瞬态非单调溶胀行为，这取决于薄膜在退火前如何浇铸。在溶剂蒸气退火（SVA）期间对溶剂溶胀的嵌段共聚物薄膜进行热循环导致薄膜在 1-10 秒内收缩，并在模板化的 45.5 和 51.5 kg/mol 聚苯乙烯-嵌段-聚二甲基硅氧烷薄膜中产生有序的微区，这些薄膜在甲苯和正庚烷蒸气中总处理时间为 30 秒至 5 分钟。
