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石墨烯 Raman D 带对载流子密度的依赖性。

The dependence of graphene Raman D-band on carrier density.

机构信息

State Key Laboratory of Low-Dimensional Quantum Physics, Department of Physics, and Tsinghua-Foxconn Nanotechnology Research Center, Tsinghua University , Beijing 100084, China.

出版信息

Nano Lett. 2013;13(12):6170-5. doi: 10.1021/nl4035048. Epub 2013 Dec 3.

Abstract

Raman spectroscopy has been an integral part of graphene research and can provide information about graphene structure, electronic characteristics, and electron-phonon interactions. In this study, the characteristics of the graphene Raman D-band, which vary with carrier density, are studied in detail, including the frequency, full width half-maximum, and intensity. We find the Raman D-band frequency increases for hole doping and decreases for electron doping. The Raman D-band intensity increases when the Fermi level approaches half of the excitation energy and is higher in the case of electron doping than that of hole doping. These variations can be explained by electron-phonon interaction theory and quantum interference between different Raman pathways in graphene. The intensity ratio of Raman D- and G-band, which is important for defects characterization in graphene, shows a strong dependence on carrier density.

摘要

拉曼光谱一直是石墨烯研究的重要组成部分,它可以提供有关石墨烯结构、电子特性和电子-声子相互作用的信息。在这项研究中,详细研究了随载流子密度变化的石墨烯拉曼 D 带的特征,包括频率、半峰全宽和强度。我们发现,对于空穴掺杂,拉曼 D 带频率增加,而对于电子掺杂,拉曼 D 带频率降低。当费米能级接近激发能量的一半时,拉曼 D 带强度增加,并且在电子掺杂的情况下比空穴掺杂的情况下更高。这些变化可以用电子-声子相互作用理论和石墨烯中不同拉曼途径之间的量子干涉来解释。拉曼 D-和 G-带的强度比,对于石墨烯中缺陷的表征非常重要,它强烈依赖于载流子密度。

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