Institute of Inorganic Chemistry of the AS CR, v. v. i., Husinec-Řež 1001, 250 68 Řež, Czech Republic.
Langmuir. 2014 Jan 14;30(1):380-6. doi: 10.1021/la404017q. Epub 2014 Jan 2.
Nanometric thin films were prepared by dip-coating and inkjet printing ZnO nanosheets on glass plates. The side-by-side alignment of the ZnO nanosheets on the substrate resulted in thin, transparent, oriented ZnO surfaces with the high-energy {001} facets exposed. The method of nanosheet deposition affected the film morphology; the dip-coated films were very smooth and nonporous, while the inkjet-printed films were rough and porous with the estimated void volume approximately 60-70% of the total film volume. The first-order rate constants for the photocatalytic degradation of 4-chlorophenol on the nanosheet-based films were approximately 2 times larger than those on nanocolumnar ZnO films or ZnO films prepared by the sol-gel technique. We attribute the high photocatalytic activity of the ZnO nanosheets to the fact that their {001} facets were predominantly exposed to the oxidized substrate. This surface arrangement and the simplicity of fabricating the ZnO nanosheet-based films make them promising for the construction of optical devices and dye-sensitized solar cells.
通过浸涂和喷墨打印将 ZnO 纳米片沉积在玻璃基板上,制备了纳米薄膜。基板上 ZnO 纳米片的并排排列导致形成了具有暴露的高能量 {001} 晶面的薄、透明、取向 ZnO 表面。纳米片沉积方法影响了薄膜形态;浸涂的薄膜非常光滑且无孔,而喷墨打印的薄膜则粗糙且多孔,估计的空隙体积约占薄膜总体积的 60-70%。基于纳米片的薄膜上 4-氯苯酚的光催化降解的一级反应速率常数大约是纳米柱状 ZnO 薄膜或溶胶-凝胶技术制备的 ZnO 薄膜的 2 倍。我们将 ZnO 纳米片的高光催化活性归因于其 {001} 晶面主要暴露于氧化的基板。这种表面排列和 ZnO 纳米片基薄膜的简单制造方法使它们有望用于构建光学器件和染料敏化太阳能电池。