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通过“还原-放电”工艺制备的图案化镍磷合金薄膜及其疏水性。

Patterned Ni-P alloy films prepared by "reducing-discharging" process and the hydrophobic property.

作者信息

Yu Quanyao, Zeng Zhixiang, Zhao Wenjie, Ma Yongcun, Wu Xuedong, Xue Qunji

机构信息

Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences , Ningbo 315201, PR China.

出版信息

ACS Appl Mater Interfaces. 2014 Jan 22;6(2):1053-60. doi: 10.1021/am404590d. Epub 2014 Jan 7.

DOI:10.1021/am404590d
PMID:24372256
Abstract

Patterned hydrophobic Ni-P alloy films consisting of orderly and regular micro-nanoscale particles were fabricated through the synergistic effect of electrochemical deposition and chemical deposition. Ni-P alloy films were deposited for different times and characterized by scanning electron microscope (SEM). It was confirmed that the addition of reducing agent induced the formation of nanoscale particles, in contrast with pure Ni film deposited by single electrochemical deposition. As "point-discharge effect", the current density was higher at the edge of the nanoscale particles, and Ni ions would be deposited at the particles through the "point-discharge effect". Then the Ni-P alloy films grew by "reducing-discharging" process. The X-ray photoelectron spectroscopy (XPS) was used to detect the composition and valence states of these alloy films. The existence of oxidation state of element P in these films corresponding to that in H2PO3(-), also gave direct evidence for the occurrence of chemical deposition, during the electrochemical deposition process. The prolongation of deposition time could provide more time for the patterned morphology to grow up. The surface roughness, evaluated by surface profilometer, increased as the deposition time extension. And these films showed gradually increased hydrophobic properties with the increase in deposition time.

摘要

通过电化学沉积和化学沉积的协同作用制备了由有序规则的微纳米级颗粒组成的图案化疏水Ni-P合金膜。对Ni-P合金膜进行不同时间的沉积,并通过扫描电子显微镜(SEM)进行表征。结果证实,与通过单一电化学沉积制备的纯Ni膜相比,还原剂的加入诱导了纳米级颗粒的形成。作为“点放电效应”,纳米级颗粒边缘的电流密度更高,Ni离子会通过“点放电效应”沉积在颗粒上。然后,Ni-P合金膜通过“还原-放电”过程生长。利用X射线光电子能谱(XPS)检测这些合金膜的组成和价态。这些膜中元素P的氧化态与H2PO3(-)中的氧化态一致,这也为电化学沉积过程中化学沉积的发生提供了直接证据。沉积时间的延长可以为图案化形态的生长提供更多时间。通过表面轮廓仪评估的表面粗糙度随着沉积时间的延长而增加。并且随着沉积时间的增加,这些膜的疏水性能逐渐增强。

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