Sin Inseok, Kang Chi Soo, Bandara Nilantha, Sun Xiang, Zhong Yongliang, Rogers Buck E, Chong Hyun-Soon
Chemistry Division, Department of Biological and Chemical Sciences, Illinois Institute of Technology, 3101 S. Dearborn St., Chicago, IL 60616, United States.
Department of Radiology, Washington University School of Medicine, St. Louis, MO 63110, United States.
Bioorg Med Chem. 2014 Apr 15;22(8):2553-62. doi: 10.1016/j.bmc.2014.02.041. Epub 2014 Mar 1.
A series of new hexadentate and pentadentate chelators were designed and synthesized as chelators of (64)Cu. The new pentadentate and hexadentate chelators contain different types of donor groups and are expected to form neutral complexes with Cu(II). The new chelators were evaluated for complex kinetics and stability with (64)Cu. The new chelators instantly bound to (64)Cu with high labeling efficiency and maximum specific activity. All (64)Cu-radiolabeled complexes in human serum remained intact for 2 days. The (64)Cu-radiolabeled complexes were further challenged by EDTA in a 100-fold molar excess. Among the (64)Cu-radiolabeled complexes evaluated, (64)Cu-complex of the new chelator E was well tolerated with a minimal transfer of (64)Cu to EDTA. (64)Cu-radiolabeled complex of the new chelator E was further evaluated for biodistribution studies using mice and displayed rapid blood clearance and low organ uptake. (64)Cu-chelator E produced a favorable in vitro and in vivo complex stability profiles comparable to (64)Cu complex of the known hexadentate NOTA chelator. The in vitro and in vivo data highlight strong potential of the new chelator E for targeted PET imaging application.
设计并合成了一系列新型六齿和五齿螯合剂作为(64)Cu的螯合剂。新型五齿和六齿螯合剂含有不同类型的供体基团,预计可与Cu(II)形成中性配合物。对新型螯合剂与(64)Cu的配合物动力学和稳定性进行了评估。新型螯合剂能以高标记效率和最大比活迅速与(64)Cu结合。人血清中的所有(64)Cu放射性标记配合物在2天内保持完整。(64)Cu放射性标记配合物在摩尔过量100倍的EDTA存在下进一步受到挑战。在评估的(64)Cu放射性标记配合物中,新型螯合剂E的(64)Cu配合物耐受性良好,(64)Cu向EDTA的转移极少。新型螯合剂E的(64)Cu放射性标记配合物进一步用于小鼠的生物分布研究,显示出快速的血液清除率和低器官摄取。(64)Cu-螯合剂E产生了与已知六齿NOTA螯合剂的(64)Cu配合物相当的良好体外和体内配合物稳定性概况。体外和体内数据突出了新型螯合剂E在靶向PET成像应用中的强大潜力。