Berdzinski Stefan, Strehmel Nadine, Lindauer Heike, Strehmel Veronika, Strehmel Bernd
Department of Chemistry and Institute for Coatings and Surface Chemistry, Niederrhein University of Applied Sciences, Adlerstr. 32, D-47798 Krefeld, Germany.
Photochem Photobiol Sci. 2014 May;13(5):789-98. doi: 10.1039/c3pp50379h.
Chlorine substituted hexaarylbisimidazole (o-Cl-HABI) efficiently initiates radical polymerization of multifunctional acrylic esters in the presence of a heterocyclic mercapto compound if the latter can form its tautomeric thione. Exposure of o-Cl-HABI results in lophyl radicals, which efficiently add to the thione in the first step while the second step releases a highly reactive thiyl radical from this intermediate. LC-MS and CID-MS measurements support this reaction scheme. Furthermore, photo-DSC experiments applying UV light between 320 and 380 nm showed that mercaptotriazole and phenylmercaptotriazole exhibited the best reactivity in the monomer 1,6-hexanediol diacrylate (HDDA) while alkyl substituted mercaptotriazoles showed less reactivity. Change of the triazole heterocycle by mercaptoimidazole resulted in a significant decrease of photoinitiation efficiency. This heterocycle does not form the corresponding thione in HDDA as shown by NMR measurements. Replacement of mercaptotriazole by an alkylthiol leads to a system showing the lowest photoinitiation efficiency in this series. Formation of thione structure in the case of heterocyclic mercapto compounds may cause higher reactivity of the heterocyclic mercapto compounds with the lophyl radical in the monomer chosen.
如果杂环巯基化合物能够形成其互变异构硫酮,则氯取代的六芳基双咪唑(邻氯 - HABI)在杂环巯基化合物存在下能有效地引发多官能丙烯酸酯的自由基聚合反应。邻氯 - HABI的曝光会产生洛菲基自由基,该自由基在第一步中能有效地加成到硫酮上,而第二步则从该中间体释放出高活性的硫自由基。液相色谱 - 质谱(LC - MS)和碰撞诱导解离质谱(CID - MS)测量结果支持了这一反应方案。此外,在320至380纳米之间施加紫外光的光差示扫描量热法(photo - DSC)实验表明,巯基三唑和苯基巯基三唑在单体1,6 - 己二醇二丙烯酸酯(HDDA)中表现出最佳的反应活性,而烷基取代的巯基三唑反应活性较低。用巯基咪唑取代三唑杂环导致光引发效率显著降低。核磁共振(NMR)测量结果表明,在HDDA中该杂环不会形成相应的硫酮。用烷基硫醇取代巯基三唑会导致该体系在该系列中表现出最低的光引发效率。对于杂环巯基化合物而言,硫酮结构的形成可能会使所选单体中杂环巯基化合物与洛菲基自由基的反应活性更高。