Egerton R F
Physics Department, University of Alberta, Edmonton, Canada T6G 2E1.
Ultramicroscopy. 2014 Oct;145:85-93. doi: 10.1016/j.ultramic.2013.10.019. Epub 2014 Mar 12.
An accelerating voltage of 100-300kV remains a good choice for the majority of TEM or STEM specimens, avoiding the expense of high-voltage microscopy but providing the possibility of atomic resolution even in the absence of lens-aberration correction. For specimens thicker than a few tens of nm, the image intensity and scattering contrast are likely to be higher than at lower voltage, as is the visibility of ionization edges below 1000eV (as required for EELS elemental analysis). In thick (>100nm) specimens, higher voltage ensures less beam broadening and better spatial resolution for STEM imaging and EDX spectroscopy. Low-voltage (e.g. 30kV) TEM or STEM is attractive for a very thin (e.g. 10nm) specimen, as it provides higher scattering contrast and fewer problems for valence-excitation EELS. Specimens that are immune to radiolysis suffer knock-on damage at high current densities, and this form of radiation damage can be reduced or avoided by choosing a low accelerating voltage. Low-voltage STEM with an aberration-corrected objective lens (together with a high-angle dark-field detector and/or EELS) offers atomic resolution and elemental identification from very thin specimens. Conventional TEM can provide atomic resolution in low-voltage phase-contrast images but requires correction of chromatic aberration and preferably an electron-beam monochromator. Many non-conducting (e.g. organic) specimens damage easily by radiolysis and radiation damage then determines the TEM image resolution. For bright-field scattering contrast, low kV can provide slightly better dose-limited resolution if the specimen is very thin (a few nm) but considerably better resolution is possible from a thicker specimen, for which higher kV is required. Use of a phase plate in a conventional TEM offers the most dose-efficient way of achieving atomic resolution from beam-sensitive specimens.
对于大多数透射电子显微镜(TEM)或扫描透射电子显微镜(STEM)样品而言,100 - 300kV的加速电压仍是一个不错的选择,它既能避免高压显微镜的高昂成本,又能在不进行透镜像差校正的情况下提供原子分辨率的可能性。对于厚度超过几十纳米的样品,图像强度和散射对比度可能会高于低电压下的情况,低于1000eV的电离边缘的可见性也是如此(这是电子能量损失谱(EELS)元素分析所必需的)。在厚(>100nm)样品中,较高的电压可确保在STEM成像和能量色散X射线光谱(EDX)分析中束斑展宽更小,空间分辨率更高。低电压(例如30kV)的TEM或STEM对于非常薄(例如10nm)的样品很有吸引力,因为它能提供更高的散射对比度,且对价电子激发EELS来说问题更少。对辐射分解免疫的样品在高电流密度下会遭受反冲损伤,通过选择低加速电压可以减少或避免这种形式的辐射损伤。配备像差校正物镜的低电压STEM(连同高角度暗场探测器和/或EELS)能从非常薄的样品中提供原子分辨率和元素识别。传统TEM可以在低电压相衬图像中提供原子分辨率,但需要校正色差,最好还配备电子束单色仪。许多非导电(如有机)样品容易因辐射分解而受损,然后辐射损伤决定了TEM图像的分辨率。对于明场散射对比度,如果样品非常薄(几纳米),低千伏能提供稍好的剂量限制分辨率,但对于较厚的样品,更高的千伏能提供更好得多的分辨率,而较厚样品需要更高的千伏。在传统TEM中使用相位板是从对束敏感的样品中实现原子分辨率的最节省剂量的方法。