Johnson Ross S, Haworth Jacob J, Finnegan Patrick S, Wheeler David R, Dirk Shawn M
Sandia National Laboratories, Organic Materials Department, P.O. Box 5800, Albuquerque, New Mexico, 87185, USA.
Macromol Rapid Commun. 2014 Jun;35(12):1116-20. doi: 10.1002/marc.201400133. Epub 2014 Apr 17.
Photolithographic patterning of a xanthate precursor to poly(3,4-diphenyl-2,5-thienylene vinylene) is described. Unlike xanthate precursors to poly(p-phenylene vinylene), the thienylene vinylene analogue patterns as a positive tone resist. Characterization of irradiated films reveals photooxidative cleavage of the vinylene linker decreases the molecular weight of the polymer (increasing the solubility of the UV-exposed areas). As a result of the mechanism, the developed pattern sees no UV light exposure, which is a significant advantage compared with negative-tone-conjugated polymer resists. Single micron resolution of a low-bandgap polymer is achieved in an efficient and scalable process.
描述了聚（3,4 - 二苯基 - 2,5 - 噻吩亚乙烯基）黄原酸酯前体的光刻图案化。与聚对苯撑乙烯基的黄原酸酯前体不同，噻吩亚乙烯基类似物图案化为正性光刻胶。辐照膜的表征表明，亚乙烯基连接体的光氧化裂解降低了聚合物的分子量（增加了紫外线曝光区域的溶解度）。由于该机制，显影后的图案未受到紫外线曝光，与负性共轭聚合物光刻胶相比，这是一个显著优势。通过高效且可扩展的工艺实现了低带隙聚合物的单微米分辨率。
