Kumar Rajesh, Kumar Girish, Umar Ahmad
J Nanosci Nanotechnol. 2014 Feb;14(2):1911-30. doi: 10.1166/jnn.2014.9120.
This review summarizes the work principles of pulse laser deposition (PLD) apparatus, physical processes like ablation, and plasma plume formation accompanying the deposition of un-doped ZnO from target to substrate material. Various modes of deposition and factors influencing the properties of thin films such as substrate temperature, background gas pressure, laser energy density (laser fluence), target to substrate distance, repetition rate, oxygen partial pressure in deposition chamber, deposition time and post growth annealing which control deposition parameters such as adsorption, desorption, surface diffusion, nucleation, and crystallization/re-crystallization are also discussed in this review. Moreover, various film properties such as morphology, roughness of the film surface, film thickness, grain size, optical transmittance, sensitivity, electrical conductivity, uniformity and electrical resistivity of the deposited ZnO thin films have also been enumerated in the present review.
本综述总结了脉冲激光沉积（PLD）设备的工作原理、诸如烧蚀等物理过程以及在从靶材到衬底材料沉积未掺杂ZnO过程中伴随形成的等离子体羽流。本综述还讨论了各种沉积模式以及影响薄膜性能的因素，如衬底温度、背景气体压力、激光能量密度（激光通量）、靶材与衬底的距离、重复频率、沉积室内的氧分压、沉积时间和生长后退火，这些因素控制着诸如吸附、解吸、表面扩散、成核以及结晶/再结晶等沉积参数。此外，本综述还列举了沉积的ZnO薄膜的各种薄膜性能，如形貌、薄膜表面粗糙度、薄膜厚度、晶粒尺寸、光学透过率、灵敏度、电导率、均匀性和电阻率。
