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用于高密度磁存储的超薄(<2 nm)氮化硅/碳双层涂层的摩擦学、耐腐蚀及微观结构性能增强

Enhanced tribological, corrosion, and microstructural properties of an ultrathin (<2 nm) silicon nitride/carbon bilayer overcoat for high density magnetic storage.

作者信息

Yeo Reuben J, Dwivedi Neeraj, Rismani Ehsan, Satyanarayana Nalam, Kundu Shreya, Goohpattader Partho S, Tan H R, Srinivasan Narasimhan, Druz Boris, Tripathy S, Bhatia C S

机构信息

Department of Electrical and Computer Engineering, National University of Singapore , Singapore 117583.

出版信息

ACS Appl Mater Interfaces. 2014 Jun 25;6(12):9376-85. doi: 10.1021/am501760p. Epub 2014 Jun 11.

Abstract

An ultrathin bilayer overcoat of silicon nitride and carbon (SiNx/C) providing low friction, high wear resistance, and high corrosion resistance is proposed for future generation hard disk media. The 16 Å thick SiNx/C overcoat consists of an atomically thin SiNx underlayer (4 Å) and a carbon layer (12 Å), fabricated by reactive magnetron sputtering and filtered cathodic vacuum arc (FCVA), respectively. When compared with monolithic overcoats of FCVA-deposited carbon (16 Å) and sputtered SiNx (16 Å), the SiNx/C bilayer overcoat demonstrated the best tribological performance with a coefficient of friction < 0.2. Despite showing marginally less electrochemical corrosion protection than monolithic SiNx, its ability to protect the magnetic media from corrosion/oxidation was better than that of an ∼27 Å thick commercial hard disk overcoat and 16 Å thick monolithic FCVA-deposited carbon. From X-ray photoelectron spectroscopy and Raman spectroscopy analyses, it was found that the introduction of the 4 Å SiNx underlayer facilitated higher sp(3) hybridization within the carbon layer by acting as a barrier and promoted the formation of strong bonds at the SiNx/C and the SiNx/media interfaces by acting as an adhesion layer. The higher sp(3) carbon content is expected to improve the thermal stability of the overcoat, which is extremely important for future hard disk drives employing heat assisted magnetic recording (HAMR).

摘要

本文提出了一种由氮化硅和碳组成的超薄双层外涂层(SiNx/C),用于下一代硬盘介质,该涂层具有低摩擦、高耐磨性和高耐腐蚀性。16 Å厚的SiNx/C外涂层由一个原子级薄的SiNx底层(4 Å)和一个碳层(12 Å)组成,分别通过反应磁控溅射和过滤阴极真空电弧(FCVA)制备。与FCVA沉积的碳(16 Å)和溅射的SiNx(16 Å)整体外涂层相比,SiNx/C双层外涂层表现出最佳的摩擦学性能,摩擦系数<0.2。尽管其电化学腐蚀防护能力略低于整体SiNx,但其保护磁性介质免受腐蚀/氧化的能力优于约27 Å厚的商用硬盘外涂层和16 Å厚的整体FCVA沉积碳。通过X射线光电子能谱和拉曼光谱分析发现,4 Å厚的SiNx底层的引入通过充当阻挡层促进了碳层内更高的sp(3)杂化,并通过充当粘附层促进了SiNx/C和SiNx/介质界面处强键的形成。较高的sp(3)碳含量有望提高外涂层的热稳定性,这对于采用热辅助磁记录(HAMR)的未来硬盘驱动器极为重要。

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