Haribabu Prashanth Konatham, Raja Krishna Kumar, Iyer Shankar
1 Department of Diagnostic Science, New Jersey Dental School, University of Medicine and Dentistry of New Jersey, Newark, NJ.
J Oral Implantol. 2014 Jun;40(3):281-4. doi: 10.1563/AAID-JOI-D-12-00037.
Iatrogenic injury to the maxillary sinus membrane is a common complication during direct sinus lift procedures. The most common cause is perforation of the Schneiderian membrane using a tungsten-carbide round bur no.6. We propose a safe technique in which an acrylic stone trimmer is used to create a window in the maxillary antrum thereby minimizing the risk of injury to the delicate sinus membrane.
上颌窦黏膜的医源性损伤是直接上颌窦提升术常见的并发症。最常见的原因是使用6号碳化钨圆钻穿孔施奈德膜。我们提出一种安全技术,即使用丙烯酸石修整器在上颌窦开一个窗口,从而将损伤脆弱的窦膜的风险降至最低。