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层状三碘化铋(BiI3)中压力诱导的结构变化和绝缘体-金属转变:一项实验与理论相结合的研究

Pressure-induced structural changes and insulator-metal transition in layered bismuth triiodide, BiI3: a combined experimental and theoretical study.

作者信息

Devidas T R, Chandra Shekar N V, Sundar C S, Chithaiah P, Sorb Y A, Bhadram V S, Chandrabhas N, Pal K, Waghmare U V, Rao C N R

机构信息

Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam-603102, India.

出版信息

J Phys Condens Matter. 2014 Jul 9;26(27):275502. doi: 10.1088/0953-8984/26/27/275502. Epub 2014 Jun 17.

DOI:10.1088/0953-8984/26/27/275502
PMID:24934819
Abstract

Noting that BiI3 and the well-known topological insulator (TI) Bi2Se3 have the same high symmetry parent structures, and that it is desirable to find a wide-band gap TI, we determine here the effects of pressure on the structure, phonons and electronic properties of rhombohedral BiI3. We report a pressure-induced insulator-metal transition near 1.5 GPa, using high pressure electrical resistivity and Raman measurements. X-ray diffraction studies, as a function of pressure, reveal a structural peculiarity of the BiI3 crystal, with a drastic drop in c/a ratio at 1.5 GPa, and a structural phase transition from rhombohedral to monoclinic structure at 8.8 GPa. Interestingly, the metallic phase, at relatively low pressures, exhibits minimal resistivity at low temperatures, similar to that in Bi2Se3. We corroborate these findings with first-principles calculations and suggest that the drop in the resistivity of BiI3 in the 1-3 GPa range of pressure arises possibly from the appearance of an intermediate crystal phase with a lower band-gap and hexagonal crystal structure. Calculated Born effective charges reveal the presence of metallic states in the structural vicinity of rhombohedral BiI3. Changes in the topology of the electronic bands of BiI3 with pressure, and a sharp decrease in the c/a ratio below 2 GPa, are shown to give rise to changes in the slope of phonon frequencies near that pressure.

摘要

注意到BiI₃与著名的拓扑绝缘体(TI)Bi₂Se₃具有相同的高对称母体结构,并且希望找到一种宽带隙拓扑绝缘体,我们在此确定压力对菱面体BiI₃的结构、声子和电子性质的影响。我们通过高压电阻率和拉曼测量报告了在1.5 GPa附近的压力诱导绝缘体-金属转变。作为压力函数的X射线衍射研究揭示了BiI₃晶体的结构特性,在1.5 GPa时c/a比急剧下降,在8.8 GPa时从菱面体结构转变为单斜结构。有趣的是,在相对较低压力下的金属相在低温下表现出最小电阻率,类似于Bi₂Se₃中的情况。我们用第一性原理计算证实了这些发现,并表明BiI₃在1-3 GPa压力范围内电阻率的下降可能源于具有较低带隙和六方晶体结构的中间晶相的出现。计算得到的玻恩有效电荷揭示了在菱面体BiI₃结构附近存在金属态。结果表明,BiI₃电子能带拓扑结构随压力的变化以及在2 GPa以下c/a比的急剧下降,导致了该压力附近声子频率斜率的变化。

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