石英玻璃中化学缺陷与拓扑缺陷之间的空间相关性：紫外共振拉曼研究。

Spatial correlation between chemical and topological defects in vitreous silica: UV-resonance Raman study.

作者信息

Saito M, D'Amico F, Bencivenga F, Cucini R, Gessini A, Principi E, Masciovecchio C

机构信息

Elettra-Sincrotrone Trieste, S. S. 14 Km 163.5, I-34149 Trieste, Italy.

出版信息

J Chem Phys. 2014 Jun 28;140(24):244505. doi: 10.1063/1.4884155.

DOI:10.1063/1.4884155

PMID:24985652

Abstract

A spatial correlation between chemical and topological defects in the tetrahedron network in vitreous silica produced by a fusion process of natural quartz crystals was found by synchrotron-based UV resonance Raman experiments. Furthermore, a quantitative correlation between these defects was obtained by comparing visible Raman and UV absorption spectra. These results indicate that in vitreous silica produced by the fusion process the topological defects disturb the surrounding tetrahedral silica network and induce further disorder regions with sub nanometric sizes.

摘要

通过基于同步加速器的紫外共振拉曼实验，发现了天然石英晶体熔融过程中产生的玻璃态二氧化硅四面体网络中化学缺陷与拓扑缺陷之间的空间相关性。此外，通过比较可见拉曼光谱和紫外吸收光谱，获得了这些缺陷之间的定量相关性。这些结果表明，在熔融过程产生的玻璃态二氧化硅中，拓扑缺陷扰乱了周围的四面体二氧化硅网络，并诱导出亚纳米尺寸的进一步无序区域。