关于还原氧化石墨烯及其表面的机理洞察。

Mechanistic insights into the reduction of graphene oxide addressing its surfaces.

作者信息

Eigler Siegfried

机构信息

Department of Chemistry and Pharmacy and Institute of Advanced Materials and Processes (ZMP), Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Dr.-Mack Str. 81, 90762 Fürth, Germany.

出版信息

Phys Chem Chem Phys. 2014 Oct 7;16(37):19832-5. doi: 10.1039/c4cp03168g.

DOI:10.1039/c4cp03168g

PMID:25115643

Abstract

Both sides of a graphene oxide (ai-GO) layer are decorated with functional groups. For the first time it is demonstrated that an effective reduction of ai-GO to graphene can be performed, even if the reducing agent can access only one side of ai-GO. A general reduction mechanism is proposed.

摘要

氧化石墨烯（ai-GO）层的两侧都带有官能团。首次证明，即使还原剂只能接触到ai-GO的一侧，也能有效地将ai-GO还原为石墨烯。并提出了一种通用的还原机制。