Ben Xue, Park Harold S
Department of Mechanical Engineering, Boston University, Boston, MA 02215, USA.
Nanotechnology. 2014 Nov 14;25(45):455704. doi: 10.1088/0957-4484/25/45/455704. Epub 2014 Oct 22.
We present a computational, atomistic study of electric field effects on the Young's modulus of metal nanowires. The simulations are electromechanically coupled, where the mechanical forces on the atoms are obtained from realistic embedded atom method potentials, and where the electrostatic forces on the atoms are obtained using a point dipole electrostatic model that is modified to account for the different polarizability and bonding environment of surface atoms. By considering three different nanowire axial orientations (left angle bracket 100 right angle bracket, left angle bracket 110 right angle bracket and right angle bracket 111 right angle bracket) of varying cross sectional sizes and aspect ratios, we find that the Young's modulus of the nanowires differs from that predicted for the purely mechanical case due to the elimination of nonlinear elastic stiffening or softening effects due to the electric field-induced positive relaxation strain relative to the relaxed mechanical configuration. We further find that left angle bracket 100 right angle bracket nanowires are most sensitive to the applied electric field, with Young's moduli that can be increased more than 20% with increasing aspect ratio. Finally, while the orientation of the transverse surfaces does impact the Young's modulus of the nanowires under applied electric field, the key factor controlling the magnitude of the stiffness change of the nanowires is the distance between atomic planes along the axial direction of the nanowire bulk.
我们展示了一项关于电场对金属纳米线杨氏模量影响的计算原子研究。模拟是机电耦合的,其中原子上的机械力由实际的嵌入原子方法势获得,而原子上的静电力使用点偶极静电模型获得,该模型经过修改以考虑表面原子不同的极化率和键合环境。通过考虑具有不同横截面尺寸和纵横比的三种不同纳米线轴向取向(〈100〉、〈110〉和〈111〉),我们发现由于相对于松弛机械构型,电场诱导的正松弛应变消除了非线性弹性硬化或软化效应,纳米线的杨氏模量不同于纯机械情况下预测的值。我们进一步发现〈100〉纳米线对施加的电场最敏感,随着纵横比增加,其杨氏模量可增加超过20%。最后,虽然横向表面的取向确实会影响施加电场下纳米线的杨氏模量,但控制纳米线刚度变化幅度的关键因素是沿纳米线本体轴向的原子平面之间的距离。