Department of Mechanical and Aerospace Engineering, North Carolina State University, Raleigh, North Carolina, 27695, USA.
Small. 2015 Mar 18;11(11):1285-92. doi: 10.1002/smll.201402750. Epub 2014 Dec 8.
Colloidal elements have historically played a key role in "bottom-up" self-assembly processes for nanofabrication. However, these elementary components can also interact with light to generate complex intensity distributions and facilitate "top-down" lithography. Here, a nanolithography technique is demonstrated based on oblique illuminations of colloidal particles to fabricate hollow-core 3D nanostructures with complex symmetry. The light-particle interaction generates an angular light distribution as governed by Mie scattering, which can be compounded by multiple illuminations to sculpt novel 3D structures in the underlying photoresist. The fabricated geometry can be controlled by the particle parameters and illumination configurations, enabling the fabrication of a large variety of asymmetric hollow nanostructures. The proposed technique has high pattern versatility, is low cost and high throughput, and can find potential application in nanoneedles, nanonozzles, and materials with anisotropic properties.
胶体元素在“自下而上”的纳米制造自组装过程中一直起着关键作用。然而,这些基本成分也可以与光相互作用,产生复杂的强度分布,并促进“自上而下”的光刻。在这里,展示了一种基于胶体粒子的斜向照明的纳米光刻技术,用于制造具有复杂对称性的中空芯 3D 纳米结构。光与粒子的相互作用产生了一个由 Mie 散射控制的角度光分布,可以通过多次照明来叠加,从而在底层光致抗蚀剂中雕刻出新颖的 3D 结构。所制造的几何形状可以通过粒子参数和照明配置来控制,从而能够制造出各种非对称的中空纳米结构。该技术具有很高的图案多样性,成本低,吞吐量高,在纳米针、纳米喷嘴和各向异性材料方面具有潜在的应用前景。