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基于胶体光刻的纳米加工。

Nanomachining by colloidal lithography.

作者信息

Yang Seung-Man, Jang Se Gyu, Choi Dae-Geun, Kim Sarah, Yu Hyung Kyun

机构信息

Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea.

出版信息

Small. 2006 Apr;2(4):458-75. doi: 10.1002/smll.200500390.

Abstract

Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.

摘要

胶体光刻是一个最近兴起的领域;这种简单技术仍在不断发展。该领域的最新进展已开发出多种实用的胶体光刻路线,这些路线极有可能至少部分地取代复杂且成本高昂的先进光刻技术。本综述介绍了胶体光刻的当前技术水平,共包括三个主要部分,首先是制备单分散胶体及其低缺陷浓度自组装的合成路线,这些胶体用作光刻掩膜。然后,我们将介绍使用反应离子刻蚀(RIE)对胶体掩膜进行的改性,该方法可产生各种纳米级特征和多面粒子。最后,将讨论胶体光刻的一些潜在应用。

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