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通过在非热等离子体中合成的纳米晶体的超音速冲击沉积形成的薄膜中的高电子迁移率。

High electron mobility in thin films formed via supersonic impact deposition of nanocrystals synthesized in nonthermal plasmas.

机构信息

Department of Energy, Environmental and Chemical Engineering, Washington University, Saint Louis, Missouri 63130, USA.

Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455, USA.

出版信息

Nat Commun. 2014 Dec 19;5:5822. doi: 10.1038/ncomms6822.

Abstract

Thin films comprising semiconductor nanocrystals are emerging for applications in electronic and optoelectronic devices including light emitting diodes and solar cells. Achieving high charge carrier mobility in these films requires the identification and elimination of electronic traps on the nanocrystal surfaces. Herein, we show that in films comprising ZnO nanocrystals, an electron acceptor trap related to the presence of OH on the surface limits the conductivity. ZnO nanocrystal films were synthesized using a nonthermal plasma from diethyl zinc and oxygen and deposited by inertial impaction onto a variety of substrates. Surprisingly, coating the ZnO nanocrystals with a few nanometres of Al2O3 using atomic layer deposition decreased the film resistivity by seven orders of magnitude to values as low as 0.12 Ω cm. Electron mobility as high as 3 cm(2) V(-1) s(-1) was observed in films comprising annealed ZnO nanocrystals coated with Al2O3.

摘要

包含半导体纳米晶体的薄膜在电子和光电设备中的应用越来越广泛,包括发光二极管和太阳能电池。为了在这些薄膜中实现高电荷载流子迁移率,需要识别和消除纳米晶体表面的电子陷阱。在此,我们表明,在包含 ZnO 纳米晶体的薄膜中,与表面上存在的 OH 有关的电子受主陷阱限制了导电性。使用二乙基锌和氧气的非热等离子体合成 ZnO 纳米晶体薄膜,并通过惯性冲击沉积在各种基底上。令人惊讶的是,使用原子层沉积在 ZnO 纳米晶体上涂覆几纳米厚的 Al2O3,将薄膜电阻率降低了七个数量级,达到低至 0.12 Ω·cm。在涂覆有 Al2O3 的退火 ZnO 纳米晶体组成的薄膜中观察到高达 3 cm2·V-1·s-1 的电子迁移率。

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