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复杂颗粒体系中纳米级接触、摩擦和划痕的分子力学机理。

Molecular mechanistic origin of nanoscale contact, friction, and scratch in complex particulate systems.

机构信息

Department of Civil and Environmental Engineering, ‡Department of Material Science and NanoEngineering, and §Smalley Institute for Nanoscale Science and Technology, Rice University , Houston, Texas 77005, United States.

出版信息

ACS Appl Mater Interfaces. 2015 Feb 11;7(5):3362-72. doi: 10.1021/am506411h. Epub 2015 Jan 16.

Abstract

Nanoscale contact mechanisms, such as friction, scratch, and wear, have a profound impact on physics of technologically important particulate systems. Determining the key underlying interparticle interactions that govern the properties of the particulate systems has been long an engineering challenge. Here, we focus on particulate calcium-silicate-hydrate (C-S-H) as a model system and use atomistic simulations to decode the interplay between crystallographic directions, structural defects, and atomic species on normal and frictional forces. By exhibiting high material inhomogeneity and low structural symmetry, C-S-H provides an excellent system to explore various contact-induced nanoscale deformation mechanisms in complex particulate systems. Our findings provide a deep fundamental understanding of the role of inherent material features, such as van der Waals versus Coulombic interactions and the role of atomic species, in controlling the nanoscale normal contact, friction, and scratch mechanisms, thereby providing de novo insight and strategies for intelligent modulation of the physics of the particulate systems. This work is the first report on atomic-scale investigation of the contact-induced nanoscale mechanisms in structurally complex C-S-H materials and can potentially open new opportunities for knowledge-based engineering of several other particulate systems such as ceramics, sands, and powders and self-assembly of colloidal systems in general.

摘要

纳米级接触机制,如摩擦、刮擦和磨损,对具有重要技术意义的颗粒系统物理学有深远影响。确定控制颗粒系统特性的关键颗粒间相互作用一直是工程学上的挑战。在这里,我们关注颗粒状钙-硅-水合物(C-S-H)作为模型系统,并使用原子模拟来解码晶体方向、结构缺陷和原子种类对正常和摩擦力的相互作用。由于 C-S-H 具有高材料非均质性和低结构对称性,因此它提供了一个极好的系统,可以探索复杂颗粒系统中各种接触诱导的纳米级变形机制。我们的研究结果提供了对固有材料特性(如范德华力与库仑力以及原子种类的作用)在控制纳米级正常接触、摩擦和刮擦机制方面的作用的深刻基本理解,从而为颗粒系统物理学的智能调控提供了新的见解和策略。这项工作是首次对结构复杂的 C-S-H 材料中接触诱导纳米级机制进行原子尺度研究的报道,它可能为基于知识的陶瓷、沙子和粉末等其他颗粒系统以及胶体系统的自组装的工程学开辟新的机会。

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