Devi M Jyostna, Taliercio Earl W, Sinclair Thomas R
Department of Crop Science, North Carolina State University, Raleigh, NC 27695, USA.
Soybean and Nitrogen Fixation Unit, USDA-ARS, Raleigh, NC 27695, USA.
J Exp Bot. 2015 Apr;66(7):1845-50. doi: 10.1093/jxb/eru520. Epub 2015 Jan 24.
Vapour pressure deficit (VPD) is considered an important environmental factor that might affect leaf expansion and transpiration rate (TR) in plants. Two slow-wilting soybean (Glycine max (L.) Merr.) genotypes PI 416937 and PI 471938 along with commercial cultivar Hutcheson were subjected to low (1.2-1.6 kPa) and high VPD (2.8-3 kPa) environments to study their leaf expansion and TR over five days. Among the three genotypes, PI 416937 had the lowest increase in its TR (34%) at high VPD compared with low VPD and the greatest decrease in leaf area (31%). In contrast, Hutcheson had the highest increase in TR (87%) under high VPD and the lowest decrease in leaf expansion rate (18%). Expansin and extensin genes were isolated in PI 416937 to determine if changes in leaf expansion were associated with changes at the molecular level. The four studied genes were all suppressed after five days in the high VPD environment.
蒸汽压亏缺（VPD）被认为是一个重要的环境因素，可能会影响植物的叶片扩展和蒸腾速率（TR）。将两个慢萎蔫大豆（Glycine max (L.) Merr.）基因型PI 416937和PI 471938以及商业品种哈奇森置于低（1.2 - 1.6千帕）和高VPD（2.8 - 3千帕）环境中，研究它们在五天内的叶片扩展和TR情况。在这三个基因型中，与低VPD相比，PI 416937在高VPD下的TR增幅最低（34%），叶面积降幅最大（31%）。相比之下，哈奇森在高VPD下的TR增幅最高（87%），叶片扩展速率降幅最低（18%）。在PI 416937中分离出扩张蛋白和伸展蛋白基因，以确定叶片扩展的变化是否与分子水平的变化相关。在高VPD环境中放置五天后，所研究的四个基因均受到抑制。
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