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原位小角 X 射线散射/广角 X 射线散射表征在硅/玻璃微反应器中的实现。

Implementation of in situ SAXS/WAXS characterization into silicon/glass microreactors.

机构信息

LUNAM, Université du Maine, Institut des Molécules et Matériaux du Mans, UMR CNRS 6283, Avenue Olivier Messiaen, 72085 Le Mans Cedex 9, France.

出版信息

Lab Chip. 2015 May 7;15(9):2002-8. doi: 10.1039/c5lc00115c.

Abstract

A successful implementation of in situ X-ray scattering analysis of synthetized particle materials in silicon/glass microreactors is reported. Calcium carbonate (CaCO3) as a model material was precipitated inside the microchannels through the counter-injection of two aqueous solutions, containing carbonate ions and calcium ions, respectively. The synthesized calcite particles were analyzed in situ in aqueous media by combining Small Angle X-ray Scattering (SAXS) and Wide Angle X-ray Scattering (WAXS) techniques at the ESRF ID02 beam line. At high wavevector transfer, WAXS patterns clearly exhibit different scattering features: broad scattering signals originating from the solvent and the glass lid of the chip, and narrow diffraction peaks coming from CaCO3 particles precipitated rapidly inside the microchannel. At low wavevector transfer, SAXS reveals the rhombohedral morphology of the calcite particles together with their micrometer size without any strong background, neither from the chip nor from the water. This study demonstrates that silicon/glass chips are potentially powerful tools for in situ SAXS/WAXS analysis and are promising for studying the structure and morphology of materials in non-conventional conditions like geological materials under high pressure and high temperature.

摘要

本文成功地实现了原位 X 射线散射分析合成的粒子材料在硅/玻璃微反应器中的应用。通过分别将含有碳酸根离子和钙离子的两种水溶液反向注入微通道,碳酸钙(CaCO3)作为模型材料在微通道内沉淀。通过在 ESRF ID02 光束线上结合小角 X 射线散射(SAXS)和广角 X 射线散射(WAXS)技术,在水溶液中对合成的方解石颗粒进行了原位分析。在高波数转移时,WAXS 图谱清晰地显示出不同的散射特征:来自溶剂和芯片玻璃盖的宽散射信号,以及来自快速沉淀在微通道内的 CaCO3 颗粒的窄衍射峰。在低波数转移时,SAXS 揭示了方解石颗粒的菱面体形态及其微米级尺寸,没有任何强烈的背景,无论是来自芯片还是来自水。这项研究表明,硅/玻璃芯片是原位 SAXS/WAXS 分析的潜在有力工具,有望用于研究在非常规条件下材料的结构和形态,如高温高压下的地质材料。

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