Brown Claire M, Reilly Andrew, Cole Richard W
1 McGill University, Advanced BioImaging Facility (ABIF), Montreal, Quebec, Canada; 2 Wadsworth Center, New York State Department of Health, Albany, New York, USA; and 3 Department of Biomedical Sciences, School of Public Health, State University of New York at Albany, New York, USA.
J Biomol Tech. 2015 Jul;26(2):37-44. doi: 10.7171/jbt.15-2602-001.
In this paper, we describe a statistically based algorithm to quantify the uniformity of illumination in an optical light microscopy imaging system that outputs a single quality factor (QF) score. The importance of homogeneous field illumination in quantitative light microscopy is well understood and often checked. However, there is currently no standard automatic quantitative measure of the uniformity of the field illumination. Images from 89 different laser-scanning confocal microscopes (LSCMs), which were collected as part of an international study on microscope quality assessment, were used as a "training" set to build the algorithm. To validate the algorithm and verify its robustness, images from 33 additional microscopes, including LSCM and wide-field (WF) microscopes, were used. The statistical paradigm used for developing the quality scoring scale was a regression approach to supervised learning. Three intensity profiles across each image-2 corner-to-corner diagonals and a center horizontal-were used to generate pixel-intensity data. All of the lines passed through the center of the image. The intensity profile data then were converted into a single-field illumination QF score in the range of 0-100, with 0 having extreme variation, and therefore, essentially unusable, and 100 having no deviation, i.e., straight lines with a constant uniform intensity. Empirically, a QF ≥ 83 was determined to be the minimum acceptable value based on manufacturer acceptance tests and reasonably achievable values. This new QF is an invaluable metric to ascertain objectively and easily the uniformity of illumination quality, provide a traceable reference for monitoring field uniformity over time, and make a direct comparison among different microscopes. The QF can also be used as an indicator of system failure and the need for alignment or service of the instrument.
在本文中,我们描述了一种基于统计的算法,用于量化光学显微镜成像系统中的光照均匀性,该系统输出一个单一的质量因子(QF)分数。均匀的场照明在定量光学显微镜中的重要性已得到充分理解且经常被检查。然而,目前尚无用于场照明均匀性的标准自动定量测量方法。作为一项关于显微镜质量评估的国际研究的一部分收集的来自89台不同激光扫描共聚焦显微镜(LSCM)的图像被用作“训练”集来构建该算法。为了验证该算法并检验其稳健性,使用了来自另外33台显微镜(包括LSCM和宽视场(WF)显微镜)的图像。用于开发质量评分量表的统计范式是一种用于监督学习的回归方法。使用横跨每张图像的三条强度剖面——两条对角斜线和一条中心水平线——来生成像素强度数据。所有这些线都穿过图像中心。然后,强度剖面数据被转换为一个范围在0 - 100之间的单场照明QF分数,其中0表示有极大变化,因此基本上无法使用,而100表示无偏差,即强度恒定均匀的直线。根据制造商的验收测试和合理可达到的值,通过经验确定QF≥83为可接受的最小值。这个新的QF是一个非常有价值的指标,可用于客观且轻松地确定照明质量的均匀性,为随时间监测场均匀性提供可追溯的参考,并在不同显微镜之间进行直接比较。该QF还可作为系统故障以及仪器需要校准或维修的指标。