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适用于未来单光子光刻的纳米发光二极管阵列制造。

Nano-LED array fabrication suitable for future single photon lithography.

作者信息

Mikulics M, Hardtdegen H

机构信息

Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany. Jülich-Aachen Research Alliance, Fundamentals of Future Information Technology (JARA-FIT), 52425 Jülich, Germany.

出版信息

Nanotechnology. 2015 May 8;26(18):185302. doi: 10.1088/0957-4484/26/18/185302. Epub 2015 Apr 15.

Abstract

We report on an alternative illumination concept for a future lithography based on single-photon emitters and important technological steps towards its implementation. Nano light-emitting diodes (LEDs) are chosen as the photon emitters. First, the development of their fabrication and their integration technology is presented, then their optical characteristics assessed. Last, size-controlled nano-LEDs, well positioned in an array, are electrically driven and utilized for illumination. Nanostructures are lithographically formed, demonstrating the feasibility of the approach. The potential of single-photon lithography to reach the ultimate scale limits in mass production is discussed.

摘要

我们报道了一种基于单光子发射器的未来光刻技术的替代照明概念以及实现该技术的重要技术步骤。选择纳米发光二极管(LED)作为光子发射器。首先,介绍了其制造和集成技术的发展,然后评估了它们的光学特性。最后,对阵列中定位良好的尺寸可控纳米LED进行电驱动并用于照明。通过光刻形成纳米结构,证明了该方法的可行性。讨论了单光子光刻在大规模生产中达到极限尺寸的潜力。

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