Maheshwari Priya, Mukherjee Saurabh, Bhattacharya Debarati, Sen Shashwati, Tokas Raj Bahadur, Honda Yoshihide, Basu Saibal, Padma Narayanan, Pujari Pradeep Kumar
⊥The Institute of Scientific Research, Osaka University, Osaka, Ibaraki, Japan.
ACS Appl Mater Interfaces. 2015 May 20;7(19):10169-77. doi: 10.1021/acsami.5b00311. Epub 2015 May 11.
Surface engineering of SiO2 dielectric using different self-assembled monolayer (SAM) has been carried out, and its effect on the molecular packing and growth behavior of copper phthalocyanine (CuPc) has been studied. A correlation between the growth behavior and performance of organic field effect transistors is examined. Depth profiling using positron annihilation and X-ray reflectivity techniques has been employed to characterize the interface between CuPc and the modified and/or unmodified dielectric. We observe the presence of structural defects or disorder due to disorientation of CuPc molecules on the unmodified dielectric and ordered arrangement on the modified dielectrics, consistent with the high charge carrier mobility in organic field effect transistors in the latter. The study also highlights the sensitivity of these techniques to the packing of CuPc molecules on SiO2 modified using different SAMs. Our study also signifies the sensitivity and utility of these two techniques in the characterization of buried interfaces in organic devices.
利用不同的自组装单分子层(SAM)对二氧化硅电介质进行了表面工程处理,并研究了其对铜酞菁(CuPc)分子堆积和生长行为的影响。研究了有机场效应晶体管的生长行为与性能之间的相关性。采用正电子湮没和X射线反射率技术进行深度剖析,以表征CuPc与改性和/或未改性电介质之间的界面。我们观察到,在未改性电介质上,由于CuPc分子的取向紊乱而存在结构缺陷或无序,而在改性电介质上则存在有序排列,这与后者有机场效应晶体管中高电荷载流子迁移率一致。该研究还突出了这些技术对使用不同SAM改性的SiO2上CuPc分子堆积的敏感性。我们的研究还表明了这两种技术在表征有机器件中掩埋界面方面的敏感性和实用性。