Cai Xingke, Sakai Nobuyuki, Ozawa Tadashi C, Funatsu Asami, Ma Renzhi, Ebina Yasuo, Sasaki Takayoshi
†International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
‡Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8571, Japan.
ACS Appl Mater Interfaces. 2015 Jun 3;7(21):11436-43. doi: 10.1021/acsami.5b02107. Epub 2015 May 19.
Tuning of the electrical properties of graphene via photoexcitation of a heteroassembled material has started to attract attention for electronic and optoelectronic applications. Actually photoinduced carrier doping from the hexagonal boron nitride (h-BN) substrate greatly modulated the transport property of the top layer graphene, showing promising potential for this approach. However, for practical applications, the large scale production of this two-dimensional heterostructure is needed. Here, a superlattice film constructed from reduced graphene oxide (rGO) and photoactive titania nanosheets (Ti0.87O2(0.52-)) was employed as a channel to construct a field effect transistor (FET) device, and its UV light response on the electrical transport property was examined. The UV light illumination induced significant improvement of the electrical conductance by ∼7 times on the basis of simultaneous enhancements of the electron carrier concentration and its mobility in rGO. Furthermore, the polarity of the FET response changed from ambipolar to n-type unipolar. Such modulated properties persisted in vacuum even after the UV light was turned off. These interesting behaviors may be explained in terms of photomodulation effects from Ti0.87O2(0.52-) nanosheets. The photoexcited electrons in Ti0.87O2(0.52-) are injected into rGO to increase the electron carrier concentration as high as 7.6×10(13) cm(-2). On the other hand, the holes are likely trapped in the Ti0.87O2(0.52-) nanosheets. These photocarriers undergo reduction and oxidation of oxygen and water molecules adsorbed in the film, respectively, which act as carrier scattering centers, contributing to the enhancement of the carrier mobility. Since the film likely contains more water molecules than oxygen, upon extinction of UV light, a major portion of electrons (∼80% of the concentration at the UV off) survives in rGO, showing the highly enhanced conductance for days. This surpassing photomodulated FET response and its persistency observed in the present superlattice system of rGO/Ti0.87O2(0.52-) are noteworthy compared with previous studies such as the device with a heteroassembly of graphene/h-BN.
通过对异质组装材料进行光激发来调节石墨烯的电学性质,已开始在电子和光电子应用领域引起关注。实际上,来自六方氮化硼(h-BN)衬底的光致载流子掺杂极大地调制了顶层石墨烯的输运性质,显示出这种方法具有广阔的应用前景。然而,对于实际应用而言,需要大规模生产这种二维异质结构。在此,由还原氧化石墨烯(rGO)和光活性二氧化钛纳米片(Ti0.87O2(0.52-))构建的超晶格薄膜被用作沟道来构建场效应晶体管(FET)器件,并研究了其对电输运性质的紫外光响应。紫外光照射在rGO中电子载流子浓度及其迁移率同时增强的基础上,使电导率显著提高了约7倍。此外,FET响应的极性从双极性转变为n型单极性。即使在紫外光关闭后,这种调制特性在真空中仍然持续存在。这些有趣的行为可以用Ti0.87O2(0.52-)纳米片的光调制效应来解释。Ti0.87O2(0.52-)中光激发的电子注入到rGO中,使电子载流子浓度增加高达7.6×10(13) cm(-2)。另一方面,空穴可能被困在Ti0.87O2(0.52-)纳米片中。这些光生载流子分别对吸附在薄膜中的氧和水分子进行还原和氧化,它们作为载流子散射中心,有助于提高载流子迁移率。由于薄膜中可能含有比氧更多的水分子,在紫外光熄灭后,大部分电子(约占紫外光关闭时浓度的80%)在rGO中留存,使得电导率在数天内都保持高度增强。与之前诸如石墨烯/h-BN异质组装器件的研究相比,在当前rGO/Ti0.87O2(0.52-)超晶格系统中观察到的这种卓越的光调制FET响应及其持久性值得关注。