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通过放电烧结和静电喷涂沉积制备的涂覆有羟基磷灰石的微孔钛植入体坯块。

Microporous Ti implant compact coated with hydroxyapatite produced by electro-discharge-sintering and electrostatic-spray-deposition.

作者信息

Jo Y J, Kim Y H, Jo Y H, Seong J G, Chang S Y, Van Tyne C J, Lee W H

出版信息

J Nanosci Nanotechnol. 2014 Nov;14(11):8439-44. doi: 10.1166/jnn.2014.9933.

DOI:10.1166/jnn.2014.9933
PMID:25958542
Abstract

A single pulse of 1.5 kJ/0.7 g of atomized spherical Ti powder from 300 μF capacitor was applied to produce the porous-surfaced Ti implant compact by electro-discharge-sintering (EDS). A solid core surrounded by porous layer was self-consolidated by a discharge in the middle of the compact in 122 μsec. Average pore size, porosity, and compressive yield strength of EDS Ti compact were estimated to be about 68.2 μm, 25.5%, and 266.4 MPa, respectively. Coatings with hydroxyapatite (HAp) on the Ti compact were conducted by electrostatic-spray-deposition (ESD) method. As-deposited HAp coating was in the form of porous structure and consisted of HAp particles which were uniformly distributed on the Ti porous structure. By heat-treatment at 700 degrees C, HAp particles were agglomerated each other and melted to form a highly smooth and homogeneous HAp thin film consisted of equiaxed nano-scaled grains. Porous-surfaced Ti implant compacts coated with highly crystalline apatite phase were successfully obtained by using the EDS and ESD techniques.

摘要

从300微法电容器中施加单个1.5千焦/0.7克雾化球形钛粉的脉冲,通过放电烧结(EDS)制备具有多孔表面的钛植入体坯块。在122微秒内,坯块中间的放电使由多孔层包围的实心芯自固结。EDS钛坯块的平均孔径、孔隙率和抗压屈服强度估计分别约为68.2微米、25.5%和266.4兆帕。采用静电喷涂沉积(ESD)方法在钛坯块上涂覆羟基磷灰石(HAp)涂层。沉积态的HAp涂层为多孔结构形式,由均匀分布在钛多孔结构上的HAp颗粒组成。通过在700℃下热处理,HAp颗粒相互团聚并熔化,形成由等轴纳米级晶粒组成的高度光滑且均匀的HAp薄膜。通过使用EDS和ESD技术,成功获得了涂覆有高结晶度磷灰石相的多孔表面钛植入体坯块。

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