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大面积单层 WS2 晶体的合成与转移:迈向蓝宝石衬底可回收利用的目标。

Synthesis and Transfer of Large-Area Monolayer WS2 Crystals: Moving Toward the Recyclable Use of Sapphire Substrates.

机构信息

†Department of Materials Science and Engineering, Faculty of Engineering, Monash University, Clayton 3800, Victoria, Australia.

‡The Melbourne Centre for Nanofabrication, 151 Wellington Road, Clayton 3168, Victoria, Australia.

出版信息

ACS Nano. 2015 Jun 23;9(6):6178-87. doi: 10.1021/acsnano.5b01480. Epub 2015 May 15.

Abstract

Two-dimensional layered transition metal dichalcogenides (TMDs) show intriguing potential for optoelectronic devices due to their exotic electronic and optical properties. Only a few efforts have been dedicated to large-area growth of TMDs. Practical applications will require improving the efficiency and reducing the cost of production, through (1) new growth methods to produce large size TMD monolayer with less-stringent conditions, and (2) nondestructive transfer techniques that enable multiple reuse of growth substrate. In this work, we report to employ atmospheric pressure chemical vapor deposition (APCVD) for the synthesis of large size (>100 μm) single crystals of atomically thin tungsten disulfide (WS2), a member of TMD family, on sapphire substrate. More importantly, we demonstrate a polystyrene (PS) mediated delamination process via capillary force in water which reduces the etching time in base solution and imposes only minor damage to the sapphire substrate. The transferred WS2 flakes are of excellent continuity and exhibit comparable electron mobility after several growth cycles on the reused sapphire substrate. Interestingly, the photoluminescence emission from WS2 grown on the recycled sapphire is much higher than that on fresh sapphire, possibly due to p-type doping of monolayer WS2 flakes by a thin layer of water intercalated at the atomic steps of the recycled sapphire substrate. The growth and transfer techniques described here are expected to be applicable to other atomically thin TMD materials.

摘要

二维层状过渡金属二卤化物(TMD)由于其奇特的电子和光学特性,在光电器件中显示出诱人的潜力。只有少数努力致力于 TMD 的大面积生长。实际应用需要通过(1)新的生长方法,在不那么严格的条件下生产大尺寸 TMD 单层,以及(2)无损转移技术,实现生长衬底的多次重复使用,来提高效率和降低生产成本。在这项工作中,我们报告了使用常压化学气相沉积(APCVD)在蓝宝石衬底上合成大尺寸(>100 μm)原子级薄二硫化钨(WS2)单晶的方法,WS2 是 TMD 家族的一员。更重要的是,我们通过水的毛细力展示了一种 PS 介导的分层过程,该过程减少了在基础溶液中的蚀刻时间,并且对蓝宝石衬底仅造成轻微的损伤。转移的 WS2 薄片具有极好的连续性,并且在重复使用的蓝宝石衬底上进行多次生长循环后,表现出相当的电子迁移率。有趣的是,在回收蓝宝石上生长的 WS2 的光致发光发射比在新鲜蓝宝石上高得多,这可能是由于原子台阶处的水层对回收蓝宝石衬底的单层 WS2 薄片进行了 p 型掺杂。这里描述的生长和转移技术预计可适用于其他原子级薄 TMD 材料。

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