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硅异质结太阳能电池的衰减全反射傅里叶变换红外光谱研究

Attenuated total reflectance Fourier-transform infrared spectroscopic investigation of silicon heterojunction solar cells.

作者信息

Holovský Jakub, De Wolf Stefaan, Jiříček Petr, Ballif Christophe

机构信息

École Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Maladière 71, CH-2000 Neuchâtel, Switzerland.

Institute of Physics ASCR, v. v. i., Cukrovarnická 10, 162 00 Prague, Czech Republic.

出版信息

Rev Sci Instrum. 2015 Jul;86(7):073108. doi: 10.1063/1.4926749.

Abstract

Silicon heterojunction solar cells critically depend on the detailed properties of their amorphous/crystalline silicon interfaces. We report here on the use of attenuated total reflectance Fourier-transform infrared (ATR-FTIR) spectroscopy to gain precise insight into the vibrational properties of the surfaces and ultrathin layers present in such solar cells. We fabricate ATR prisms from standard silicon wafers similar to those used for device fabrication. In this fashion, we acquire very-high sensitivity FTIR information on device-relevant structures. Our method has no requirement for minimum layer thickness, enabling the study of the impact of the different fabrication process steps on the film microstructure. We discuss the necessary requirements for the method implementation and give a comprehensive overview of all observed vibration modes. In particular, we study vibrational signatures of Si-H(X), Si-H(X)(Si(Y)O(Z)), B-H, hydroxyl groups, and hydrocarbons on the Si(111) surface. We observe subtle effects in the evolution of the chemical state of the surface during sample storage and process-related wafer handling and discuss their effect on the electronic properties of the involved interfaces.

摘要

硅异质结太阳能电池严重依赖于其非晶硅/晶体硅界面的详细特性。我们在此报告使用衰减全反射傅里叶变换红外(ATR-FTIR)光谱法,以精确洞察此类太阳能电池中存在的表面和超薄层的振动特性。我们用与用于器件制造的标准硅片类似的材料制作ATR棱镜。通过这种方式,我们获得了与器件相关结构的超高灵敏度FTIR信息。我们的方法对最小层厚度没有要求,能够研究不同制造工艺步骤对薄膜微观结构的影响。我们讨论了方法实施的必要条件,并对所有观察到的振动模式进行了全面概述。特别是,我们研究了Si(111)表面上Si-H(X)、Si-H(X)(Si(Y)O(Z))、B-H、羟基和碳氢化合物的振动特征。我们观察到在样品存储和与工艺相关的晶圆处理过程中表面化学状态演变的细微影响,并讨论了它们对相关界面电子特性的影响。

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