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胺官能化硅量子点的热发光猝灭:一项pH值和波长依赖性研究。

Thermal luminescence quenching of amine-functionalized silicon quantum dots: a pH and wavelength-dependent study.

作者信息

Chatterjee Surajit, Mukherjee Tushar Kanti

机构信息

Discipline of Chemistry, Indian Institute of Technology Indore, M-Block, IET-DAVV Campus, Khandwa Road, Indore-452017, M.P., India.

出版信息

Phys Chem Chem Phys. 2015 Oct 7;17(37):24078-85. doi: 10.1039/c5cp04483a. Epub 2015 Aug 28.

Abstract

Understanding and resolving the mechanisms that affect the photoluminescence (PL) of Si QDs are of great importance because of their strong potential for optoelectronic and solar cell materials. In this article, the intrinsic exciton dynamics of water-dispersed allylamine-functionalized silicon quantum dots (Si QDs) have been explored as a function of temperature by means of steady-state and time-resolved PL spectroscopy. Significant PL quenching of Si QDs has been observed with increase in temperature from 278 K to 348 K. This thermal quenching is found to be a reversible process. The mechanism involves nonradiative reversible relaxation of conduction band electrons through the thermally-created temporary trap states. These temporary trap states arise due to the displacement of surface atoms from their regular positions at elevated temperature. Upon cooling, these surface irregularities relax back to their equilibrium positions with retrieval of the original PL intensity. It has been observed that the quenching mechanism is strongly influenced by the pH and excitation wavelength (λex). At pH 3.5, the quenching mechanism involves nonradiative relaxation of conduction band electrons through the thermally-created temporary trap states. However, at pH 7.4, the unprotonated surface amine groups introduce permanent nitrogen-related surface defects inside the bandgap of Si QDs. At elevated temperature, the conduction band electrons get trapped in these nitrogen-related surface defects through the involvement of thermally-created temporary trap states. Subsequent exciton recombination of these nitrogen-related defect states results in red-shifted green color luminescence. By using the Arrhenius equation we have estimated the activation energy of this nonradiative thermal relaxation process and it was found to be 138 and 139 meV at pH 3.5 and pH 7.4, respectively.

摘要

由于硅量子点在光电子和太阳能电池材料方面具有巨大潜力,了解和解决影响其光致发光(PL)的机制非常重要。在本文中,通过稳态和时间分辨PL光谱研究了水分散的烯丙胺功能化硅量子点(Si QDs)的本征激子动力学随温度的变化。随着温度从278 K升高到348 K,观察到Si QDs的PL显著猝灭。发现这种热猝灭是一个可逆过程。其机制涉及导带电子通过热产生的临时陷阱态进行非辐射可逆弛豫。这些临时陷阱态是由于表面原子在高温下从其正常位置位移而产生的。冷却后,这些表面不规则性恢复到平衡位置,同时恢复原始的PL强度。已经观察到猝灭机制受到pH值和激发波长(λex)的强烈影响。在pH 3.5时,猝灭机制涉及导带电子通过热产生的临时陷阱态进行非辐射弛豫。然而,在pH 7.4时,未质子化的表面胺基团在Si QDs的带隙内引入了与氮相关的永久性表面缺陷。在高温下,导带电子通过热产生的临时陷阱态的参与而被困在这些与氮相关的表面缺陷中。随后这些与氮相关的缺陷态的激子复合导致绿色发光红移。通过使用Arrhenius方程,我们估计了这种非辐射热弛豫过程的活化能,发现在pH 3.5和pH 7.4时分别为138和139 meV。

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