Min Jeong, Han Jae-Hee, Lee Jung-Hun, Yoo Ji-Beom, Kwon Sang Jik, Cho Eou Sik
J Nanosci Nanotechnol. 2015 Mar;15(3):2027-31. doi: 10.1166/jnn.2015.10265.
A diode-pumped Q-switched neodymium-doped yttrium vanadate (Nd:YVO4, λ = 1064 nm) laser was applied to obtain graphene patterns on a photopolymer layer by direct ablation. In the transfer process of the graphene layer, the photopolymer was employed as a graphene supporting layer and it was not removed for the simplification of the process. The laser ablation was carried out on graphene/photopolymer double layers for various beam conditions. The results showed that the laser-ablated widths on the graphene/photopolymer double layer were much greater than those on the graphene monolayer, especially at lower scanning speeds and at higher repetition rates. The photopolymer layer was not removed by the laser ablation, and the thermal energy was considered to have been dissipated in the lateral direction of graphene instead of being conducted vertically to the glass substrate. The Raman spectrum results showed that the graphene layer was clearly removed on the laser-ablated region of interest.
采用二极管泵浦调Q掺钕钒酸钇（Nd:YVO4，λ = 1064 nm）激光器，通过直接烧蚀在光聚合物层上获得石墨烯图案。在石墨烯层的转移过程中，光聚合物用作石墨烯支撑层，为简化工艺未将其去除。在各种光束条件下对石墨烯/光聚合物双层进行激光烧蚀。结果表明，石墨烯/光聚合物双层上的激光烧蚀宽度远大于石墨烯单层上的烧蚀宽度，尤其是在较低扫描速度和较高重复频率下。激光烧蚀未去除光聚合物层，热能被认为是在石墨烯的横向耗散，而不是垂直传导至玻璃基板。拉曼光谱结果表明，在感兴趣的激光烧蚀区域，石墨烯层被明显去除。
