基底形貌引导纳米多孔金薄膜中孔形态的演变。
Substrate Topography Guides Pore Morphology Evolution in Nanoporous Gold Thin Films.
作者信息
Chapman Christopher A R, Daggumati Pallavi, Gott Shannon C, Rao Masaru P, Seker Erkin
机构信息
Department of Biomedical Engineering, University of California - Davis, Davis, CA 95616, USA.
Electrical & Computer Engineering, University of California - Davis, Davis, CA 95616, USA.
出版信息
Scr Mater. 2016 Jan 1;110:33-36. doi: 10.1016/j.scriptamat.2015.07.039.
Abstract
This paper illustrates the effect of substrate topography on morphology evolution in nanoporous gold (np-Au) thin films. One micron-high silicon ridges with widths varying between 150 nm to 50 µm were fabricated and coated with 500 nm-thick np-Au films obtained by dealloying sputtered gold-silver alloy films. Analysis of scanning electron micrographs of the np-Au films following dealloying and thermal annealing revealed two distinct regimes where the ratio of film thickness to ridge width determines the morphological evolution of np-Au films.
摘要
本文阐述了基底形貌对纳米多孔金（np-Au）薄膜形态演变的影响。制备了宽度在150纳米至50微米之间变化的1微米高的硅脊，并在其上涂覆了通过溅射金-银合金薄膜脱合金化得到的500纳米厚的np-Au薄膜。对脱合金化和热退火后的np-Au薄膜的扫描电子显微镜图像分析表明，存在两种不同的情况，其中薄膜厚度与脊宽度的比值决定了np-Au薄膜的形态演变。
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