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锗/硅锗耦合量子阱中的巨大电光效应。

Giant electro-optic effect in Ge/SiGe coupled quantum wells.

作者信息

Frigerio Jacopo, Vakarin Vladyslav, Chaisakul Papichaya, Ferretto Marcello, Chrastina Daniel, Le Roux Xavier, Vivien Laurent, Isella Giovanni, Marris-Morini Delphine

机构信息

L-NESS, Dipartimento di Fisica, Politecnico di Milano, Polo di Como, Via Anzani 42, I 22100 Como, Italy.

Institut d'Electronique Fondamentale, Univ. Paris-Sud, CNRS UMR 8622, Bât. 220, 91405 Orsay Cedex, France.

出版信息

Sci Rep. 2015 Oct 19;5:15398. doi: 10.1038/srep15398.

Abstract

Silicon-based photonics is now considered as the photonic platform for the next generation of on-chip communications. However, the development of compact and low power consumption optical modulators is still challenging. Here we report a giant electro-optic effect in Ge/SiGe coupled quantum wells. This promising effect is based on an anomalous quantum-confined Stark effect due to the separate confinement of electrons and holes in the Ge/SiGe coupled quantum wells. This phenomenon can be exploited to strongly enhance optical modulator performance with respect to the standard approaches developed so far in silicon photonics. We have measured a refractive index variation up to 2.3 × 10(-3) under a bias voltage of 1.5 V, with an associated modulation efficiency V(π)L(π) of 0.046 V cm. This demonstration paves the way for the development of efficient and high-speed phase modulators based on the Ge/SiGe material system.

摘要

硅基光子学如今被视为下一代片上通信的光子平台。然而,开发紧凑且低功耗的光调制器仍具有挑战性。在此,我们报道了锗/硅锗耦合量子阱中的巨大电光效应。这种有前景的效应基于反常量子限制斯塔克效应,这是由于电子和空穴在锗/硅锗耦合量子阱中的分离限制所致。相对于目前硅光子学中已开发的标准方法,该现象可用于显著提高光调制器性能。在1.5伏的偏置电压下,我们测量到折射率变化高达2.3×10⁻³,相关的调制效率V(π)L(π)为0.046伏·厘米。这一演示为基于锗/硅锗材料系统的高效高速相位调制器的开发铺平了道路。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1ae7/4609994/89d18b6a22b4/srep15398-f1.jpg

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