Bowler D R, Owen J H G, Miki K
UCL Department of Physics and Astronomy, University College London, Gower Street, London WC1E 6BT, UK. London Centre for Nanotechnology, University College London, Gower Street, London WC1E 6BT, UK.
Nanotechnology. 2006 Mar 28;17(6):1801-2. doi: 10.1088/0957-4484/17/6/N01. Epub 2006 Mar 3.
A recent article (Miwa et al 2005 Nanotechnology 16 2427) casts doubt on the four-dimer-wide Haiku model for the Bi nanoline on Si(001), suggesting instead that the three-dimer-wide Miki model (which had been ruled out) is a better fit in particular to x-ray data. The reasons why the Haiku model provides the best fit to all published data among currently proposed structures are discussed, concentrating on the width and registry of the Bi nanoline, and mentioning new data which shows that under appropriate conditions the two structures coexist in the same surface.
最近的一篇文章（Miwa等人，2005年，《纳米技术》16卷，2427页）对硅（001）上铋纳米线的四聚体宽俳句模型提出了质疑，相反，它认为三聚体宽的三木模型（此前已被排除）尤其更符合X射线数据。文中讨论了在当前提出的结构中，俳句模型为何能最符合所有已发表数据的原因，重点关注铋纳米线的宽度和配准情况，并提及了新数据，这些数据表明在适当条件下，这两种结构会在同一表面共存。
