Zhao Jiaoling, Qi Hongji, Wang Hu, He Hongbo, Zhang Weili
Opt Lett. 2015 Nov 15;40(22):5168-71. doi: 10.1364/OL.40.005168.
Random antireflective structures are fabricated on fused silica by the thermal dewetting process and reactive ion etching, which shows a broadband antireflective effect over the whole visible wavelength. However, the transmittance in the ultraviolet is limited by the scattering from the etched structures. A graded refractive index model ignoring the scattering in the visible range is applied to extract the etched profile. Then the Lubachevsky-Stillinger algorithm is used to reconstruct the random antireflective structures with the extracted profile. Bidirectional scattering distribution for the reconstructed structures is simulated with the finite-difference time-domain method, which indicates the importance of transmissive scattering the scattering directivity. The scattering directivity is explained well with an effective grating model. The period of the effective grating can guide the prepared technique in the ultraviolet.
通过热脱湿工艺和反应离子刻蚀在熔融石英上制备了随机抗反射结构，该结构在整个可见波长范围内呈现宽带抗反射效果。然而，紫外光的透过率受刻蚀结构散射的限制。应用忽略可见光范围内散射的渐变折射率模型来提取刻蚀轮廓。然后使用卢巴切夫斯基 - 斯蒂林格算法，根据提取的轮廓重建随机抗反射结构。用有限时域差分法模拟重建结构的双向散射分布，这表明了透射散射方向性的重要性。用有效光栅模型很好地解释了散射方向性。有效光栅的周期可以指导紫外光的制备技术。
