Wu Jingjun, Ye Xin, Sun Laixi, Huang Jin, Wen Jibin, Geng Feng, Zeng Yong, Li Qingzhi, Yi Zao, Jiang Xiaodong, Zhang Kuibao
Opt Express. 2018 Jan 22;26(2):1361-1374. doi: 10.1364/OE.26.001361.
This work presents a low-cost, simple, convenient, advanced technology to prepare large-area defect-free subwavelength structures (SWSs). SWSs were obtained by a metal-induced one-step self-masking RIE process on a fused-silica surface, in which metal-fluoride (mainly ferrous-fluoride) nanodots were used to induce and gather stable fluorocarbon polymer etching inhibitors in the RIE polymers as masks. The SWS growth processes are visible with an increase in etching time and some exhibit prominent broadband antireflective properties from the visible to the near-infrared wavelength range. Transmission in the 600-900-nm range increased from approximately 93% for the polished fused silica to above 99% for the double-side SWSs on fused silica. A theoretical simulation by a finite-difference time-domain method agreed well with the experiments. Moreover, the surface of the SWSs exhibits excellent superhydrophilic properties.
这项工作提出了一种低成本、简单、便捷、先进的技术来制备大面积无缺陷的亚波长结构（SWSs）。通过在熔融石英表面进行金属诱导的一步自掩蔽反应离子刻蚀（RIE）工艺获得了SWSs，其中金属氟化物（主要是氟化亚铁）纳米点被用作掩膜，用于在RIE聚合物中诱导和聚集稳定的碳氟聚合物蚀刻抑制剂。随着蚀刻时间的增加，可以看到SWS的生长过程，并且一些SWS在从可见光到近红外波长范围内表现出显著的宽带抗反射特性。在600 - 900nm范围内的透过率从抛光熔融石英的约93%增加到熔融石英双面SWS的99%以上。通过时域有限差分法进行的理论模拟与实验结果吻合良好。此外，SWS的表面表现出优异的超亲水性能。
