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具有硅掺杂渐变超晶格的氮化铟镓/氮化镓发光二极管的静电放电特性

Electrostatic Discharge Characteristics of InGaN/GaN Light-Emitting Diodes with Si-Doped Graded Superlattice.

作者信息

Lee Kwanjae, Lee Cheul-Ro, Kim Jin Soo, Lee Jin Hong, Lim Kee Young, Leem Jae-Young

出版信息

J Nanosci Nanotechnol. 2015 Oct;15(10):7733-7. doi: 10.1166/jnn.2015.11189.

Abstract

We report the influences of a Si-doped graded superlattice (SiGSL) on the electrostatic discharge (ESD) characteristics of an InGaN/GaN light-emitting diode (LED). For comparison, a conventional InGaN/GaN LED (C-LED) was also investigated. The luminous efficacy for the SiGSL-LED was 2.68 times stronger than that for the C-LED at the injection current of 20 mA. The resistances estimated from current-voltage (I-V) characteristic curves were 16.5 and 8.8 Ω for the C-LED and SiGSL-LED, respectively. After the ESD treatment at the voltages of 4000 and 6000 V, there was no significant change in the I-V curves for the SiGSL-LED. Also, there was small variation in the I-V characteristics for the SiGSL-LED at the ESD voltage of 8000 V. However, the I-V curves for the C-LED were drastically degraded with increasing ESD voltage. While the light emission was not observed at the injection current of 20 mA from the C-LED sample after the ESD treatment, the emission spectra for the SiGSL-LED sample were clearly measured with the output powers of 10.47, 9.66, and 7.27 mW for the ESD voltages of 4000, 6000, and 8000 V respectively.

摘要

我们报告了硅掺杂渐变超晶格(SiGSL)对氮化铟镓/氮化镓发光二极管(LED)静电放电(ESD)特性的影响。为作比较,还研究了传统的氮化铟镓/氮化镓LED(C-LED)。在20 mA的注入电流下,SiGSL-LED的发光效率比C-LED高2.68倍。根据电流-电压(I-V)特性曲线估算,C-LED和SiGSL-LED的电阻分别为16.5和8.8 Ω。在4000 V和6000 V电压下进行ESD处理后,SiGSL-LED的I-V曲线没有明显变化。此外,在8000 V的ESD电压下,SiGSL-LED的I-V特性变化很小。然而,随着ESD电压的增加,C-LED的I-V曲线急剧退化。ESD处理后,在20 mA的注入电流下,C-LED样品未观察到发光,而对于SiGSL-LED样品,分别在4000、6000和8000 V的ESD电压下,清晰测量到发射光谱,输出功率分别为10.47、9.66和7.27 mW。

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