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硅基同质外延 InGaN/GaN 蓝光发光二极管反向漏电流特性的显著改善。

Significant improvement of reverse leakage current characteristics of Si-based homoepitaxial InGaN/GaN blue light emitting diodes.

作者信息

Lee Moonsang, Lee Hyun Uk, Song Keun Man, Kim Jaekyun

机构信息

Korea Basic Science Institute, Daejeon, 34133, Republic of Korea.

Advanced Nano-surface Research Group, Korea Basic Science Institute, Daejeon, 34133, Republic of Korea.

出版信息

Sci Rep. 2019 Jan 30;9(1):970. doi: 10.1038/s41598-019-38664-x.

Abstract

The nature of reverse leakage current characteristics in InGaN/GaN blue light emitting diodes (LEDs) on freestanding GaN crystals detached from a Si substrate is investigated for the first time, using temperature-dependent current-voltage (T-I-V) measurement. It is found that the Si-based homoepitaxial InGaN/GaN LEDs exhibit a significant suppression of the reverse leakage current without any additional processes. Their conduction mechanism can be divided into variable-range hopping and nearest neighbor hopping (NNH) around 360 K, which is enhanced by Poole-Frenkel emission. The analysis of T-I-V curves of the homoepitaxial LEDs yields an activation energy of carriers of 35 meV at -10 V, about 50% higher than that of the conventional ones (E = 21 meV at -10 V). This suggests that our homoepitaxial InGaN/GaN LEDs bears the high activation energy as well as low threading dislocation density (about 1 × 10/cm), effectively suppressing the reverse leakage current. We expect that this study will shed a light on the high reliability and carrier tunneling characteristics of the homoepitaxial InGaN/GaN blue LEDs produced from a Si substrate and also envision a promising future for their successful adoption by LED community via cost-effective homoepitaxial fabrication of LEDs.

摘要

首次使用温度相关电流-电压(T-I-V)测量法,研究了从硅衬底分离的独立氮化镓晶体上的氮化铟镓/氮化镓蓝光发光二极管(LED)的反向漏电流特性的本质。结果发现,基于硅的同质外延氮化铟镓/氮化镓发光二极管在没有任何额外工艺的情况下,反向漏电流得到了显著抑制。其传导机制在360 K左右可分为变程跳跃和最近邻跳跃(NNH),并通过普尔-弗伦克尔发射得到增强。对同质外延发光二极管的T-I-V曲线分析得出,在-10 V时载流子的激活能为35 meV,比传统发光二极管(在-10 V时E = 21 meV)高出约50%。这表明我们的同质外延氮化铟镓/氮化镓发光二极管具有高激活能以及低穿位错密度(约1×10/cm),有效地抑制了反向漏电流。我们期望这项研究将为从硅衬底生产的同质外延氮化铟镓/氮化镓蓝色发光二极管的高可靠性和载流子隧穿特性提供启示,并设想通过具有成本效益的发光二极管同质外延制造,使其在发光二极管领域成功应用拥有光明的未来。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4ce0/6353897/8a0e876b8db8/41598_2019_38664_Fig1_HTML.jpg

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