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氧化温度对云母衬底上热氧化ZnO薄膜特性的影响。

Effect of Oxidation Temperature on Characteristics of Thermally Oxidized ZnO Thin Films on Mica Substrates.

作者信息

Moon Jiyun, Kim Younggyu, Kim Byunggu, Leem Jae-Young

出版信息

J Nanosci Nanotechnol. 2015 Nov;15(11):8464-7. doi: 10.1166/jnn.2015.11449.

DOI:10.1166/jnn.2015.11449
PMID:26726535
Abstract

Muscovite mica is one of the promising alternatives to polymer substrates because of its good thermal resistivity, flexibility, and transparency. In this study, metallic Zn films with a thickness of 300 nm were deposited on mica substrates through thermal evaporation; the thin films were then oxidized by annealing at temperatures ranging from 350 to 550 degrees C. The structural and optical properties of thermally oxidized ZnO thin films were investigated. Diffraction peaks for ZnO (100) and (002) planes were observed only for the ZnO thin films oxidized at temperatures above 450 degrees C. These films consisted of relatively rough film-like structures, and the average transmittance of the films was greater than 70% in the visible region. The highest near-band-edge emission was observed for the ZnO thin films oxidized at 500 degrees C. Upon increasing the oxidation temperatures to 500 degrees C, the optical band gap was blue-shifted.

摘要

白云母因其良好的热阻性、柔韧性和透明度,是聚合物基材有前景的替代材料之一。在本研究中,通过热蒸发在云母基材上沉积了厚度为300 nm的金属锌膜;然后将这些薄膜在350至550摄氏度的温度范围内退火氧化。研究了热氧化ZnO薄膜的结构和光学性质。仅在450摄氏度以上温度氧化的ZnO薄膜中观察到了ZnO(100)和(002)平面的衍射峰。这些薄膜由相对粗糙的膜状结构组成,并且薄膜在可见光区域的平均透过率大于70%。在500摄氏度氧化的ZnO薄膜中观察到最高的近带边发射。当氧化温度升高到500摄氏度时,光学带隙发生蓝移。

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