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氮化、磷化和砷化的单层多孔石墨烯。

Nitrogenated, phosphorated and arsenicated monolayer holey graphenes.

作者信息

Yagmurcukardes Mehmet, Horzum Seyda, Torun Engin, Peeters Francois M, Senger R Tugrul

机构信息

Department of Physics, Izmir Institute of Technology, 35430 Izmir, Turkey.

Department of Physics, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium and Department of Engineering Physics, Faculty of Engineering, Ankara University, 06100 Ankara, Turkey.

出版信息

Phys Chem Chem Phys. 2016 Jan 28;18(4):3144-50. doi: 10.1039/c5cp05538e.

Abstract

Motivated by a recent experiment that reported the synthesis of a new 2D material nitrogenated holey graphene (C2N) [Mahmood et al., Nat. Commun., 2015, 6, 6486], the electronic, magnetic, and mechanical properties of nitrogenated (C2N), phosphorated (C2P) and arsenicated (C2As) monolayer holey graphene structures are investigated using first-principles calculations. Our total energy calculations indicate that, similar to the C2N monolayer, the formation of the other two holey structures are also energetically feasible. Calculated cohesive energies for each monolayer show a decreasing trend going from the C2N to C2As structure. Remarkably, all the holey monolayers considered are direct band gap semiconductors. Regarding the mechanical properties (in-plane stiffness and Poisson ratio), we find that C2N has the highest in-plane stiffness and the largest Poisson ratio among the three monolayers. In addition, our calculations reveal that for the C2N, C2P and C2As monolayers, creation of N and P defects changes the semiconducting behavior to a metallic ground state while the inclusion of double H impurities in all holey structures results in magnetic ground states. As an alternative to the experimentally synthesized C2N, C2P and C2As are mechanically stable and flexible semiconductors which are important for potential applications in optoelectronics.

摘要

受最近一项报道合成新型二维材料氮化多孔石墨烯(C2N)的实验[Mahmood等人,《自然通讯》,2015年,6卷,6486页]的启发,我们使用第一性原理计算研究了氮化(C2N)、磷化(C2P)和砷化(C2As)单层多孔石墨烯结构的电子、磁性和力学性能。我们的总能计算表明,与C2N单层类似,其他两种多孔结构的形成在能量上也是可行的。计算得到的每个单层的内聚能显示出从C2N到C2As结构的下降趋势。值得注意的是,所有考虑的多孔单层都是直接带隙半导体。关于力学性能(面内刚度和泊松比),我们发现C2N在这三个单层中具有最高的面内刚度和最大的泊松比。此外,我们的计算表明,对于C2N、C2P和C2As单层,N和P缺陷的产生会将半导体行为转变为金属基态,而在所有多孔结构中引入双H杂质会导致磁基态。作为实验合成的C2N的替代物,C2P和C2As是机械稳定且灵活的半导体,对光电子学中的潜在应用很重要。

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