Department of Materials Science and Engineering, University of Toronto , 184 College Street, Toronto, ON, Canada M5S 3E4.
Department of Mechanical and Industrial Engineering, University of Toronto , 5 King's College Road, Toronto, ON, Canada M5S 3G8.
ACS Nano. 2016 Feb 23;10(2):1939-47. doi: 10.1021/acsnano.5b05771. Epub 2016 Jan 13.
Graphene oxide (GO) is considered as one of the most promising layered materials with tunable physical properties and applicability in many important engineering applications. In this work, the interfacial behavior of multilayer GO films was directly investigated via GO-to-GO friction force microscopy, and the interfacial shear strength (ISS) was measured to be 5.3 ± 3.2 MPa. Based on high resolution atomic force microscopy images and the available chemical data, targeted molecular dynamics simulations were performed to evaluate the influence of functional structure, topological defects, and interlayer registry on the shear response of the GO films. Theoretical values for shear strength ranging from 17 to 132 MPa were predicted for the different structures studied, providing upper bounds for the ISS. Computational results also revealed the atomic origins of the stochastic nature of friction measurements. Specifically, the wide scatter in experimental measurements was attributed to variations in functional structure and topological defects within the sliding volume. The findings of this study provide important insight for understanding the significant differences in strength between monolayer and bulk graphene oxide materials and can be useful for engineering topological structures with tunable mechanical properties.
氧化石墨烯(GO)被认为是最有前途的层状材料之一,具有可调的物理性质和在许多重要工程应用中的适用性。在这项工作中,通过 GO 到 GO 摩擦力显微镜直接研究了多层 GO 薄膜的界面行为,并测量了界面剪切强度(ISS)为 5.3±3.2MPa。基于高分辨率原子力显微镜图像和可用的化学数据,进行了有针对性的分子动力学模拟,以评估官能团结构、拓扑缺陷和层间配准对 GO 薄膜剪切响应的影响。针对所研究的不同结构,预测了剪切强度的理论值范围为 17-132MPa,为 ISS 提供了上限。计算结果还揭示了摩擦测量中随机性质的原子起源。具体来说,实验测量中的广泛分散归因于滑动体积内官能团结构和拓扑缺陷的变化。这项研究的结果为理解单层和块状氧化石墨烯材料之间强度的显著差异提供了重要的见解,并可用于工程具有可调机械性能的拓扑结构。