Yeon Jejoon, van Duin Adri C T, Kim Seong H
Department of Mechanical and Nuclear Engineering, ‡Materials Research Institute, and §Department of Chemical Engineering, The Pennsylvania State University , University Park, Pennsylvania 16802, United States.
Langmuir. 2016 Feb 2;32(4):1018-26. doi: 10.1021/acs.langmuir.5b04062. Epub 2016 Jan 21.
Molecular dynamics (MD) simulations with the ReaxFF reactive force field were carried out to find the atomistic mechanisms for tribochemical reactions occurring at the sliding interface of fully hydroxylated amorphous silica and oxidized silicon as a function of interfacial water amount. The ReaxFF-MD simulations showed a significant amount of atom transfers across the interface occurs during the sliding. In the absence of water molecules, the interfacial mixing is initiated by dehydroxylation followed by the Si-O-Si bond formation bridging two solid surfaces. In the presence of submonolayer thick water, the dissociation of water molecules can provide additions reaction pathways to form the Si-O-Si bridge bonds and atom transfers across the interface. However, when the amount of interfacial water molecules is large enough to form a full monolayer, the degree of atom transfer is substantially reduced since the silicon atoms at the sliding interface are terminated with hydroxyl groups rather than forming interfacial Si-O-Si bridge bonds. The ReaxFF-MD simulations clearly showed the role of water molecules in atomic scale mechanochemical processes during the sliding and provided physical insights into tribochemical wear processes of silicon oxide surfaces observed experimentally.
采用ReaxFF反应力场进行分子动力学(MD)模拟,以探究在完全羟基化的无定形二氧化硅与氧化硅滑动界面处发生的摩擦化学反应的原子机制,该机制是界面水量的函数。ReaxFF-MD模拟表明,滑动过程中界面上发生了大量的原子转移。在没有水分子的情况下,界面混合由脱羟基引发,随后形成桥接两个固体表面的Si-O-Si键。在存在亚单层厚水的情况下,水分子的解离可以提供额外的反应途径,以形成Si-O-Si桥键并实现界面间的原子转移。然而,当界面水分子的量足够大以形成完整单分子层时,原子转移程度会大幅降低,因为滑动界面处的硅原子被羟基封端,而不是形成界面Si-O-Si桥键。ReaxFF-MD模拟清楚地显示了水分子在滑动过程中原子尺度机械化学过程中的作用,并为实验观察到的氧化硅表面摩擦化学磨损过程提供了物理见解。