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光热诱导的二氧化钒中的肖特基纳米结和间接莫特转变:光电流分析

Photoheat-induced Schottky nanojunction and indirect Mott transition in VO₂: photocurrent analysis.

作者信息

Kim Hyun-Tak, Kim Minjung, Sohn Ahrum, Slusar Tetiana, Seo Giwan, Cheong Hyeonsik, Kim Dong-Wook

机构信息

Metal-Insulator-Transition Center, Electronics & Telecommunications Research Institute, Daejeon 305-700, Korea. School of Advanced Device Technology, Korea University of Science and Technology, Daejeon 305-333, Korea.

出版信息

J Phys Condens Matter. 2016 Mar 2;28(8):085602. doi: 10.1088/0953-8984/28/8/085602. Epub 2016 Feb 1.

Abstract

In order to elucidate a mechanism of the insulator-to-metal transition (IMT) for a Mott insulator VO2 (3d(1)), we present Schottky nanojunctions and the structural phase transition (SPT) by simultaneous nanolevel measurements of photocurrent and Raman scattering in microlevel devices. The Schottky nanojunction with the monoclinic metallic phase between the monoclinic insulating phases is formed by the photoheat-induced IMT not accompanied with the SPT. The temperature dependence of the Schottky junction reveals that the Mott insulator has an electronic structure of an indirect subband between the main Hubbard d bands. The IMT as reverse process of the Mott transition occurs by temperature-induced excitation of bound charges in the indirect semiconductor band, most likely formed by impurities such as oxygen deficiency. The metal band (3d(1)) for the Mott insulator is screened (trapped) by the indirect band (impurities).

摘要

为了阐明莫特绝缘体VO₂(3d¹)的绝缘体-金属转变(IMT)机制,我们通过在微观器件中同时进行光电流和拉曼散射的纳米级测量,展示了肖特基纳米结和结构相变(SPT)。在单斜绝缘相之间具有单斜金属相的肖特基纳米结是由光热诱导的IMT形成的,且不伴随SPT。肖特基结的温度依赖性表明,莫特绝缘体在主要哈伯德d带之间具有间接子带的电子结构。作为莫特转变逆过程的IMT是由温度诱导间接半导体带中束缚电荷的激发而发生 的,该间接半导体带很可能是由诸如氧缺陷等杂质形成的。莫特绝缘体的金属带(3d¹)被间接带(杂质)屏蔽(俘获)。

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