Ning Xuewen, Wang Xixin, Yu Xiaofei, Zhao Jianling, Wang Mingli, Li Haoran, Yang Yang
School of Materials Science and Engineering, Hebei University of Technology, Tianjin 300130, China.
Nanoscience Technology Center, Department of Materials and Engineering, University of Central Florida, Orlando, Florida 32826, US.
Sci Rep. 2016 Mar 4;6:22634. doi: 10.1038/srep22634.
Mn-doped TiO2 micro/nanostructure porous film was prepared by anodizing a Ti-Mn alloy. The film annealed at 300 °C yields the highest areal capacitance of 1451.3 mF/cm(2) at a current density of 3 mA/cm(2) when used as a high-performance supercapacitor electrode. Areal capacitance retention is 63.7% when the current density increases from 3 to 20 mA/cm(2), and the capacitance retention is 88.1% after 5,000 cycles. The superior areal capacitance of the porous film is derived from the brush-like metal substrate, which could greatly increase the contact area, improve the charge transport ability at the oxide layer/metal substrate interface, and thereby significantly enhance the electrochemical activities toward high performance energy storage. Additionally, the effects of manganese content and specific surface area of the porous film on the supercapacitive performance were also investigated in this work.
通过对Ti-Mn合金进行阳极氧化制备了掺锰TiO₂微/纳米结构多孔薄膜。当用作高性能超级电容器电极时，在300°C退火的薄膜在3 mA/cm²的电流密度下产生最高面积电容1451.3 mF/cm²。当电流密度从3增加到20 mA/cm²时，面积电容保持率为63.7%，在5000次循环后电容保持率为88.1%。多孔薄膜优异的面积电容源自刷状金属基底，其可大大增加接触面积，提高氧化物层/金属基底界面处的电荷传输能力，从而显著增强对高性能储能的电化学活性。此外，本工作还研究了多孔薄膜的锰含量和比表面积对超级电容性能的影响。
