Institute for Semiconductor Technology and Laboratory for Emerging Nanometrology, TU Braunschweig , Braunschweig 38092, Germany.
University of Freiburg , Friedrichstrasse 39, Freiburg im Breisgau 79098, Germany.
ACS Appl Mater Interfaces. 2016 Mar;8(12):8232-8. doi: 10.1021/acsami.5b12583. Epub 2016 Mar 17.
The long-term stability of InGaN photoanodes in liquid environments is an essential requirement for their use in photoelectrochemistry. In this paper, we investigate the relationships between the compositional changes at the surface of n-type In(x)Ga(1-x)N (x ∼ 0.10) and its photoelectrochemical stability in phosphate buffer solutions with pH 7.4 and 11.3. Surface analyses reveal that InGaN undergoes oxidation under photoelectrochemical operation conditions (i.e., under solar light illumination and constant bias of 0.5 VRHE), forming a thin amorphous oxide layer having a pH-dependent chemical composition. We found that the formed oxide is mainly composed of Ga-O bonds at pH 7.4, whereas at pH 11.3 the In-O bonds are dominant. The photoelectrical properties of InGaN photoanodes are intimately related to the chemical composition of their surface oxides. For instance, after the formation of the oxide layer (mainly Ga-O bonds) at pH 7.4, no photocurrent flow was observed, whereas the oxide layer (mainly In-O bonds) at pH 11.3 contributes to enhance the photocurrent, possibly because of its reported high photocatalytic activity. Once a critical oxide thickness was reached, especially at pH 7.4, no significant changes in the photoelectrical properties were observed for the rest of the test duration. This study provides new insights into the oxidation processes occurring at the InGaN/liquid interface, which can be exploited to improve InGaN stability and enhance photoanode performance for biosensing and water-splitting applications.
在液体环境中,InGaN 光电阳极的长期稳定性是其在光电化学中应用的基本要求。在本文中,我们研究了 n 型 In(x)Ga(1-x)N(x∼0.10)表面组成变化与其在 pH 值为 7.4 和 11.3 的磷酸盐缓冲溶液中的光电化学稳定性之间的关系。表面分析表明,InGaN 在光电化学操作条件下(即在太阳光照和 0.5 VRHE 的恒定偏压下)会发生氧化,形成具有 pH 值依赖性化学成分的薄非晶氧化物层。我们发现,形成的氧化物在 pH 值为 7.4 时主要由 Ga-O 键组成,而在 pH 值为 11.3 时则主要由 In-O 键组成。InGaN 光电阳极的光电性能与其表面氧化物的化学成分密切相关。例如,在 pH 值为 7.4 时形成氧化物层(主要是 Ga-O 键)后,没有观察到光电流流动,而在 pH 值为 11.3 时的氧化物层(主要是 In-O 键)有助于增强光电流,可能是因为其具有高的光催化活性。一旦达到临界氧化物厚度,特别是在 pH 值为 7.4 时,在其余测试时间内,光电性能没有明显变化。这项研究为 InGaN/液体界面上发生的氧化过程提供了新的见解,可用于提高 InGaN 的稳定性,并增强用于生物传感和水分解应用的光电阳极性能。