School of Chemistry and Chemical Engineering, Institute of Theoretical and Computational Chemistry, Key Laboratory of Mesoscopic Chemistry of MOE, Nanjing University, Nanjing 210093, P. R. China.
Nanoscale. 2016 May 14;8(18):9657-66. doi: 10.1039/c6nr01683a. Epub 2016 Apr 22.
The search for new two-dimensional topological insulators (2D-TIs) with large band gaps is of great interest and importance. Our first-principles calculations predicted three candidates for 2D-TIs, arsenene functionalized with F, OH and CH3 groups (AsX, X = F, OH and CH3), which preserved large bulk band gaps from 100 to 160 meV (up to 260 meV) derived from the spin-orbit coupling (SOC) within the px,y orbitals. This picture is similar to what was reported for an AsH monolayer with a band gap of 193 meV. Ab initio molecular dynamic (AIMD) simulations demonstrated the thermal stabilities of the AsX monolayers even at 500 K. The nontrivial topological phase was confirmed by the topological invariant Z2 and topological edge state. The topological electronic bandgap of the AsF monolayer can be effectively modulated by biaxial tensile strain and vertical external electric field. In addition, pronounced light absorption in the near-infrared and visible range of the solar spectrum was expected for the AsX (X = H, F) monolayers from the adsorption peaks at 0.45-1.6 eV, which is attractive for light harvesting. The nontrivial quantum spin Hall (QSH) insulators AsX could be promising candidates for practical room-temperature applications in dissipationless transport devices and photovoltaics.
寻找具有大带隙的新型二维拓扑绝缘体(2D-TIs)具有重要意义。我们的第一性原理计算预测了三种二维拓扑绝缘体候选材料,即芳基(arsenene)官能化的 F、OH 和 CH3 基团(AsX,X = F、OH 和 CH3),它们在 px,y 轨道内的自旋轨道耦合(SOC)作用下保留了 100 到 160meV(高达 260meV)的大体带隙。这种情况与具有 193meV 带隙的单层砷烷的报道相似。基于第一性原理的分子动力学(AIMD)模拟表明,即使在 500K 的温度下,AsX 单层的热稳定性也很高。拓扑不变量 Z2 和拓扑边缘态证实了非平凡的拓扑相。AsF 单层的拓扑电子带隙可以通过双轴拉伸应变和垂直外电场有效调节。此外,AsX(X = H、F)单层在 0.45-1.6eV 的吸附峰处预期在近红外和可见光范围内有明显的光吸收,这对于光捕获是有吸引力的。非平凡的量子自旋霍尔(QSH)绝缘体 AsX 可能是在无耗散传输器件和光伏应用中实现实际室温应用的有前途的候选材料。